Epoxy resin composition for semiconductor encapsulation and semiconductor device
A technology of epoxy resin and semiconductor, which is applied in the direction of semiconductor devices, semiconductor/solid device parts, electric solid devices, etc., can solve the problems of high resistivity epoxy resin composition, high insulation, insufficient electrical characteristics, etc. To achieve the effect of avoiding short circuit or leakage, preventing re-condensation, and avoiding deformation of metal wires
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Embodiment 1
[0026]The compounding components of Table 1 were mixed with a mixer at room temperature, melted and kneaded with a heating roll at 80 to 100°C, and the kneaded product was cooled and then pulverized to obtain an epoxy resin composition. The obtained epoxy resin composition was evaluated by the following evaluation method. The results are shown in Table 2.
[0027] Table 1
[0028] Biphenyl type epoxy resin; "YX4000”
Melting point 105℃,
Epoxy resin equivalent 195g / eq, oiled shell ring
Oxygen resin company
8.5 parts by weight
Phenolic resin for phenol paint; softening point 65℃,
Hydroxyl equivalent 104g / eq
4.5 parts by weight
Spherical fused silica; average particle size 22μm,
Maximum particle size 75μm
84.4 parts by weight
Carbon precursor A; "CB-3-600”,
H / C weight% ratio = 3 / 96, average particle size
3μm, maximum particle size 20μm, resistivity value 1
×10 6 Ω·cm, manufactured by Mitsui Mines
1.0 part by weig...
Embodiment 2~ Embodiment 4
[0045] Except that 1.8 parts by weight (Example 2), 3.0 parts by weight (Example 3), and 0.5 parts by weight (Example 4) were used instead of 1.0 part by weight of the carbon precursor A, the same as in Example 1 was used. Method to proceed. In addition, the blending amount of the spherical fused silica is adjusted according to the change in the blending amount of the carbon precursor A.
Embodiment 5
[0047] Except that the following carbon precursor B was used instead of the carbon precursor A, the same procedure as in Example 1 was performed. The results are shown in Table 2.
[0048] The carbon precursor B: After drying the spherical phenol resin with an average particle diameter of 15 μm, it was fired at 650° C. for 4 hours to obtain a carbon precursor B with a yield of 99%. The physical properties of the obtained carbon precursor B are hydrogen / carbon weight% ratio = 2 / 97, the average particle size is 10 μm, the maximum particle size is 30 μm, and the resistivity value is 1×10 4 Ω·cm.
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