Low radiation glass capable of being post-treated and its production process

A technology of low-emissivity glass and manufacturing method, which is applied in sputtering coating, metal material coating process, ion implantation coating, etc., can solve the problems of high glass transportation cost, long patch cycle, and inability to coat, etc., to meet the requirements of Long-distance transportation, stable optical performance, and various colors

Inactive Publication Date: 2007-11-07
SHENZHEN CSG APPLIED TECH CO LTD
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  • Summary
  • Abstract
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AI Technical Summary

Problems solved by technology

These phenomena are the appearance of the damaged silver layer, and cannot be mass-produced
[0007] In traditional low-e glass processing, glass can only be tempered first and then coated. Traditional low-e energy-saving glass cannot be extended to automobile glass, nor can it be extended to residential buildings on a large scale. This is because:
[0008] 1. Unable to achieve curved glass coating
[0009] Bending toughened and hot-bent glass is widely used in modern buildings and a

Method used

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  • Low radiation glass capable of being post-treated and its production process

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Example Embodiment

[0031] Example: With reference to the attached drawings, the manufacturing method of the low-e glass which can be processed subsequently according to the present invention firstly cleans and dries the glass substrate, and then adopts a vacuum magnetron sputtering coating process. The coating line is equipped with a high-speed pump Oil molecular pump, background vacuum in high vacuum 3*10 -6 Above mbar, and plating on the glass according to the following steps:

[0032] 1. Plating silicon nitride (Si 3 N 4 ) The base-layer dielectric composite film layer (1) is sputtered and deposited in an argon-nitrogen atmosphere with an intermediate frequency power supply and rotation, the power is 85kw, the intermediate frequency power supply frequency is 40kHz, and the film thickness is 37nm;

[0033] Second, the silicon nitride (Si 3 N 4 ) The base dielectric composite film layer (1) is plated with zinc tin oxide (ZnSnOx) base dielectric composite film (2), which is sputtered and deposited i...

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Abstract

The low radiation glass capable of being post-treated is prepared through cleaning glass substrate, drying and coating film, and features that the vacuum magnetically controlled sputtered film on the glass substrate includes Si3N4 film, ZnSnOx film, NiCrOx film, Ag film, NiCrOx film, ZnSnO film and Si3N4 film successively coated. The coated glass has low radiation, stable optical performance, different colors, capacity of being toughened and/or bent at high temperature up to 700 deg.c, and capacity of being cut and treated in other modes.

Description

technical field [0001] The invention relates to low-emissivity glass, in particular to low-emission glass capable of subsequent processing and a manufacturing method thereof. Background technique [0002] Low-emissivity glass (also known as LOW-E glass) is a film system product composed of multiple layers of metal or other compounds coated on the surface of the glass. Due to the low emissivity of the silver layer, the low emissivity glass has a high transmittance to visible light, a high reflectivity to infrared rays, and good heat insulation performance. [0003] The film layer structure of ordinary low-emissivity glass produced by vacuum magnetron sputtering is generally: glass / base dielectric composite layer / barrier layer (1) / Ag layer / barrier layer (2) / upper dielectric composite layer. [0004] The dielectric combination layer is generally a metal or non-metal oxide or nitride, such as TiO 2 , ZnSnOx, SnO 2 , ZnO, SiO 2 、 Ta 2 o 5 、BiO 2 、Al 2 o 3 , ZnAl 2 o 4 ...

Claims

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Application Information

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IPC IPC(8): C03C17/36C23C14/34C03C4/00
Inventor 陈可明曾小绵
Owner SHENZHEN CSG APPLIED TECH CO LTD
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