High-purity implanting planar array microelectrode and its production
A planar array and manufacturing method technology, applied in the direction of electrodes, artificial respiration, physical therapy, etc., can solve the problems of increasing the density of micro-electrode arrays, complex manufacturing process, and difficult realization, so as to improve the stimulation or recording effect, simple manufacturing process, Ease of mass production
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[0018] The specific characteristics of the high-density implantable planar array microelectrode manufacturing method provided by the present invention are further described below in conjunction with the accompanying drawings:
[0019] 1) Clean the silicon wafer 1 with a conventional semiconductor process cleaning method, and prepare an aluminum film 2 with a thickness of about 1 micron on the surface, as a sacrificial layer for electroplating conductive structures and release (Fig. 1);
[0020] 2) Baking the silicon wafer at 120°C for 20 minutes, spin-coating 6809 photoresist (3000 rpm, 30 seconds) on the aluminum film layer of the silicon wafer, and pre-baking at 80°C for 20 minutes;
[0021] 3) Photolithography, sputtering Ti / Pt / Ti (2500 Ȧ), combined with Lift-off process, forming electrode stimulation site or recording site metal layer 3 (Fig. 2);
[0022] 4) Spin-coat photosensitive polyimide Durimide 7510 (3000 rpm, 30 seconds), make an isolation insulating layer 4, and f...
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