High-purity implanting planar array microelectrode and its production
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
- Publication Date
- 2007-11-21
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a method for manufacturing a high-density implanted planar array microelectrode, which can be applied to the fields of neurological disease treatment, neurobiological basic research and the like, and belongs to the field of implanted microelectrodes. Background technique
[0002] Neural engineering system is currently a very active and rapidly developing research field, such as brain-computer interface, neural prosthesis and other issues have received more and more attention. In a neuroengineered system, the most fundamental and critical part is the neuro-electronic interface, the electrodes. According to different objects of action and application goals, people have successively researched and developed various forms of implantable microelectrodes, including hoop-shaped microelectrodes, needle-shaped array microelectrodes, planar array microelectrodes, and sieve-shaped microelectrodes. Among them, the planar array microelectr...