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Magnesium oxide single crystal vapor deposition material and process for producing the same

A technology of vapor deposition materials and manufacturing methods, which is applied to the growth of polycrystalline materials, chemical instruments and methods, and single crystal growth, and can solve problems such as insufficient suppression of splashing

Inactive Publication Date: 2008-01-16
TATEHO CHEM IND CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the MgO single crystal obtained by optimizing the particle size in this way can increase the film formation rate, it still cannot sufficiently suppress the generation of sputtering, and it cannot be said that it can satisfy the requirements of the final MgO film from the viewpoint of homogeneity.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] 1. Manufacture of MgO single crystal evaporation material

[0038] The MgO single crystal obtained by the arc electrofusion method was cleaved using a blade-shaped impactor, thereby processing it into a substantially rectangular parallelepiped shape. That is, the tip of the blade of the blade-shaped impactor in contact with the crushed object applying the impact force is a straight line longer than the length of the crushed object, and has a width of 5×10 at the tip portion. -4The cutting edge is made of steel with an included angle of 13.5 degrees below m, and the impact body with an impact weight of 5 kg / m per unit length of the blade is prepared to form an angle of 4 degrees to the cleavage plane at 10 m / s. The impact of the speed, thus breaking the MgO single crystal. This crushing step is performed by striking blade-shaped impactors at predetermined intervals while moving the object to be crushed, and the size of the obtained crushed object is controlled by the mo...

Embodiment 2

[0054] Adjust the angle of the blade-shaped impactor to the cleavage plane of the MgO single crystal to 2 degrees, and set the moving amounts A to C of the crushed objects to 5×10 -3 m, 5×10 -3 m and 3×10 -3 m, and sieving with a 4.7-mesh metal mesh, the MgO single crystal vapor deposition material and the MgO film using it as a target were produced in the same manner as in Example 1, and the same evaluation test was performed. The results are shown in Table 1.

Embodiment 3

[0056] When crushing the MgO single crystal, the movement amounts A to C of the crushed objects are respectively set to 4×10 -3 m, 4×10 -3 m and 3×10 -3 m, after sieving, use an electric furnace to carry out heat treatment for 1200 seconds at 1473K, except that, the MgO single crystal vapor deposition material and the MgO film using it as a target are produced in the same manner as in Example 1, and the same evaluation test is carried out. The results are shown in Table 1.

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Abstract

This invention provides a single crystal MgO vapor deposition material for use as a target material for forming an MgO film on a substrate by a vacuum vapor deposition method such as an electron beam vapor deposition method. This vapor deposition material does not reduce a film formation speed during vapor deposition and, at the same time, can prevent the occurrence of splash, and has excellent film properties, for example, can improve, for example, discharge characteristics when used as a protective film for PDP. A magnesium oxide single crystal vapor deposition material is also provided in which the half value width of a rocking curve on a magnesium oxide (200) face is 0.005 to 0.025 degree. There is also provided a process for producing a magnesium oxide single crystal vapor deposition material comprising the step of disintegrating a magnesium oxide single crystal. In the disintegration step, a blade-type impactor is allowed to collide at an angle of -5 to +5 degrees to magnesium oxide (100) face orientation for cleavage.

Description

technical field [0001] The present invention relates to a magnesium oxide (MgO) single crystal vapor deposition material and a manufacturing method thereof. The magnesium oxide single crystal vapor deposition material is used, for example, in the manufacture of plasma display panels ( Hereinafter, it is used as a vapor deposition source in the case of a protective film for "PDP". Background technique [0002] A PDP utilizing a discharge luminescent phenomenon is being developed as a flat panel display that can be easily enlarged. In AC-type PDPs whose transparent electrodes are covered with a glass dielectric, a protective film is usually formed on the dielectric in order to prevent the surface of the dielectric from deteriorating due to ion impact sputtering and the discharge voltage from increasing. This protective film is required to have a low discharge voltage and be excellent in sputtering resistance. [0003] As a protective film satisfying this requirement, an MgO ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24H01J9/02H01J11/02H01J11/22H01J11/34H01J11/40
CPCC30B29/16C30B23/02C23C14/24H01J11/40
Inventor 东淳生川口祥史国重正明
Owner TATEHO CHEM IND CO
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