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Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method

A technology of strontium barium niobate, transparent and conductive, applied in nonlinear optics, instruments, optics, etc., can solve the problems of not having epitaxial growth transmission, etc., and achieve good market prospects, low cost, and good transparency.

Inactive Publication Date: 2008-04-30
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the epitaxial growth direction of the lanthanum nickelate material on the MgO substrate is the (110) direction, so it does not have the effect of (001) direction epitaxial growth transmission

Method used

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  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method
  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method
  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Using lithium carbonate and nickel oxide as raw materials, mix 15% lithium carbonate and 85% nickel oxide according to the mass percentage, grind for 4 hours, press at a pressure of 5MPa, and sinter in air at a sintering temperature of 850 ℃, the heating rate is controlled at 300℃ / h, the holding time is controlled at 2h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 25%, After mixing 30% barium carbonate and 45% niobium oxide, grind for 4 hours, press and shape at a pressure of 6 MPa, and sinter in air, the sintering temperature is 880 °C, the heating rate is controlled at 400 °C / h, and the holding time is controlled at 2.5 h, the strontium barium niobate target was obtained after cooling down; the prepared lithium nickelate target was used to deposit lithium nickelate film on the (001) MgO substrate by pulse laser deposition me...

Embodiment 2

[0030] Using lithium carbonate and nickel oxide as raw materials, mix 10% lithium carbonate and 90% nickel oxide according to the mass percentage, grind for 3 hours, press at a pressure of 2MPa, and sinter in air at a sintering temperature of 800 ℃, the heating rate is controlled at 100℃ / h, the holding time is controlled at 1h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 30%, After mixing 10% barium carbonate and 60% niobium oxide, grind for 5 hours, press and shape at a pressure of 10MPa, and sinter in air, the sintering temperature is 900°C, the heating rate is controlled at 600°C / h, and the holding time is controlled at 3h , after cooling down, the barium strontium niobate target was obtained; the prepared lithium nickelate target was used to deposit lithium nickelate film on the (001) MgO substrate by pulse laser deposition metho...

Embodiment 3

[0032] Using lithium carbonate and nickel oxide as raw materials, mix 17% lithium carbonate and 83% nickel oxide according to the mass percentage, grind for 3 hours, press at a pressure of 5 MPa, and sinter in air at a sintering temperature of 850 ℃, the heating rate control range is 300℃ / h, the holding time is controlled at 1h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 26% , 16% barium carbonate mixed with 58% niobium oxide, ground for 3 hours, press-molded with a pressure of 5MPa, and sintered in air, the sintering temperature was 850°C, the heating rate was controlled at 300°C / h, and the holding time was controlled at After 2 hours, the barium strontium niobate target was obtained after cooling down; using the prepared lithium nickelate target, the lithium nickelate film was deposited on the (001) MgO substrate by using the pulsed...

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Abstract

The invention discloses an epitaxial niobium acid strontium barium film with a transparent and conductive nickel acid lithium bottom electrode and the preparing method. One face of an MgO base plate is epitaxially aggraded with a LNO nickel acid lithium transparent and conductive layer LNO film, and a SBN film is epitaxially prepared on the LNO film. The preparing steps are as follows: firstly, lithium carbonate, nickel oxide, niobium oxide, strontium carbonate and barium carbonate are served as materials, and lithium carbonate target material and niobium acid strontium barium target material are respectively prepared using a solid state sintered method. Secondly, the (001) MgO base plate is placed in a reacting chamber after being cleaned. The reacting chamber is pumped into vacuum and the base plated is heated. Oxygen is served as protective gas, and is guided into the reacting chamber. The target material is spattered by impulse laser, and nickel acid lithium conductive electrode and niobium acid strontium barium film are orderly and epitaxially aggraded on the base plate. The preparing method of the invention is simple. The prepared niobium acid strontium barium film (001) directionally and epitaxially grows. The epitaxial performance and the quality of the film are good, and the electro-optical coefficient is large (r33 can reach 180 pm / V to 230 pm / V). Thereby the invention has excellent applied foreground.

Description

technical field [0001] The invention relates to a preparation technology of an optical waveguide film on a (001) MgO substrate, in particular to a PLD preparation of a transparent conductive epitaxial lithium nickelate bottom electrode layer, followed by an epitaxial high electro-optic coefficient barium strontium niobate film and a preparation method thereof. Background technique [0002] Optical waveguide material is an electro-optic material with broad application prospects. It is a material that can confine light waves in a medium with a size of the wavelength of light, and transmit long distances without radiation. Common optical waveguide devices include (1). Optical interconnectors (straight, S-curved) (2). Power splitters (1:2: Y-type and MMI type) (3). Optical waveguide reflectors (mirrors and Grating) (4). Bidirectional coupler (5). Polarizer (6). Polarizing beam splitter (anisotropic polarizing beam splitter) (7). Phase modulator (E-O phase modulator) (8). Intens...

Claims

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Application Information

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IPC IPC(8): G02F1/035G02F1/03
Inventor 杜丕一李晓婷麦炽良黄健洪翁文剑韩高荣赵高凌沈鸽徐刚张溪文
Owner ZHEJIANG UNIV
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