Method for preparing trichlorosilane and polycrystalline silicon by transforming silicon tetrachloride
A silicon tetrachloride and polycrystalline silicon technology, applied in the direction of halogenated silicon compounds, halogenated silanes, etc., can solve the problems of small equipment investment, low primary conversion rate, low energy consumption, etc., and achieve improved primary conversion rate, good economic benefits and The effect of social benefit
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0027] Example: Using silicon tetrachloride as raw material, the main production is SiHCl 3 , a device system and a production method for co-producing polysilicon and by-producing HCl.
[0028] figure 1 An apparatus system for carrying out the method of the invention is presented. The device system is mainly composed of a plasma generator 2, a plasma power supply 1 providing electric energy for the plasma generator, a reactor 5 vertically arranged below the plasma generator 2, and a gas buffer vertically arranged below the reactor 5. Container 6, a waste heat exchanger 7 connected to the gas buffer vessel 6, a condenser 8 connected to the gas outlet pipe of the waste heat exchanger 7, a fractionation tower 9 connected to the condensed liquid outlet of the condenser 8, and a gas outlet pipe connected to the condenser 8 The tail gas separation system 12 that the outlet is connected is in order to separate and store hydrogen, argon and hydrogen chloride gas, the trichlorosilane...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com