Colouring phototonus composition for color filter, color filter, manufacturing method thereof and liquid crystal display device

A technology of photosensitive composition and color filter, which is applied in chemical instruments and methods, photosensitive materials used in photomechanical equipment, instruments, etc., can solve the problems that there is no research on specific methods, and achieve improved development latitude and deep curing Improvement of properties and inhibition of alkali solubility

Inactive Publication Date: 2008-09-10
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned Patent Document 1 mainly describes in detail the method of applying the photosensitive composition to a photosensitive lithographic printing plate, and in the application of a photosensitive lithographic printing plate material, the effects of

Method used

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  • Colouring phototonus composition for color filter, color filter, manufacturing method thereof and liquid crystal display device
  • Colouring phototonus composition for color filter, color filter, manufacturing method thereof and liquid crystal display device
  • Colouring phototonus composition for color filter, color filter, manufacturing method thereof and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0395] (Preparation of Colored Photosensitive Composition)

[0396] Here, the example which prepared the coloring photosensitive composition A1 containing a coloring agent (pigment) as the color filter formation for liquid crystal display element use is mentioned and demonstrated.

[0397] 1-1. Preparation of Pigment Dispersion (P1)

[0398] 150 parts by mass of C.I. Pigment Green 36 and C.I. Pigment Yellow 150 (mass ratio) mixture of 150 parts by mass, alkali-soluble resin (benzyl methacrylate / methacrylic acid, molar ratio of 70 / 30, Mw of 5000 ) 50 mass parts, 50 mass parts of pigment dispersant EFKA4330 (manufactured by EFKA company) and the mixed solution of 750 mass parts of propylene glycol methyl ether acetate as solvent were mixed with ball mill and dispersed for 15 hours to prepare pigment dispersion (P1).

[0399] About the obtained pigment dispersion liquid (P1), the average particle diameter of a pigment was measured by the dynamic light scattering method, and it w...

Embodiment 2～10

[0456] Except that the specific thiol compound in the composition A1 used in the preparation of the colored photosensitive composition A1 in Example 1: Exemplary compound (A-1) was replaced by the exemplary compound described in the following Table 1, all other Coloring photosensitive compositions A2 to A10 were prepared according to the following in the same manner as in Example 1, and a color filter having a colored pattern using the composition was obtained. Furthermore, the same evaluation as in Example 1 was performed. The results are shown in Table 1.

[0457]

[0458] · Pigment dispersion (P1) 8000 parts by mass

[0459] ・Alkali-soluble resin: benzyl methacrylate / methacrylic acid, molar ratio 70 / 30, Mw 5000 80 parts by mass

[0460] · Polymerizable compound: dipentaerythritol hexaacrylate having the following structure, 100 unsaturated equivalents, and 0 ethyleneoxy groups (manufactured by Nippon Kayaku Co., Ltd.) 450 parts by mass

[0461] ・Polymerizable compound...

Embodiment 11

[0470] Except for changing the polymerizable compound in the composition A1 and its amount used in the preparation of the colored photosensitive composition A1 in Example 1, everything is the same as in Example 1, and the colored photosensitive composition was prepared according to the following Composition A11 was used to obtain a color filter having a colored pattern using the composition. Furthermore, the same evaluation as in Example 1 was performed. The results are shown in Table 1.

[0471]

[0472]· Pigment dispersion (P1) 8000 parts by mass

[0473] ・Alkali-soluble resin: benzyl methacrylate / methacrylic acid, molar ratio 70 / 30, Mw 5000 80 parts by mass

[0474] · Polymerizable compound: dipentaerythritol hexaacrylate having the following structure, 100 unsaturated equivalents, and 0 ethyleneoxy groups (manufactured by Nippon Kayaku Co., Ltd.) 600 parts by mass

[0475] Photopolymerization initiator: 120 parts by mass of 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphe...

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Abstract

The invention provides a coloring photosensitive composition for a color filter, the color filter, a manufacturing method thereof and a liquid crystal display device. The composition can obtain sufficient deep solidifying property on exposure for forming a coloring pattern with excellent development solubility, development latitude and pattern forming property, and realizing high contrast. The composition includes (A) a thiol compound represented by the formula (I), (B) a six-aryl-link imidazole compound, (C) a polymerism compound with alkenes unsaturated double bonds compound, (D) a dye and (E) a dye dispersant. In formula (I), A is a heterocyclic with a group that is represented by any of formula (a)-(c). In formula (a)-(c), L<1>, L<2>, L<3> represent single bond, oxygen atom, sulfur atom, -N(R<12>)-, phenylene, or linkage group combined with more than two groups independently; R<1>-R<12> represent hydrogen atom or organic group with one valence independently.

Description

technical field [0001] The present invention relates to a colored photosensitive composition for color filters used in liquid crystal display elements (LCD) and solid-state imaging elements (CCD, CMOS, etc.), color filters formed using the composition, methods for producing the same, and liquid crystals Display components. This patent application claims the priority of Japanese Patent Application No. 2007-054642 filed on March 5, 2007 and Japanese Patent Application No. 2008-007392 filed on January 16, 2008. Background technique [0002] Conventionally, as a method for forming a pattern of a colored photosensitive composition, there is a photolithography method in which a colored photosensitive composition is applied to the entire surface of a substrate, dried, and then partially and selectively irradiated with active energy rays such as ultraviolet rays. For curing, only the uncured part is removed by development to form a pattern, and a colored photosensitive composition ...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/028G03F7/004G02B5/23G02F1/1335
CPCC09B23/107C09B29/366G02B5/223G02B5/23G03F7/0007G03F7/004G03F7/027G03F7/033
Inventor 疋田政宪
Owner FUJIFILM CORP
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