Method for growing high quality nano-diamond membrane with low cost

A nano-diamond, high-quality technology, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of poor reusability, high preparation cost and limited life of hot wire, and achieve unique field emission advantages , The effect of low preparation cost and large excitation current
CN101294274AInactive Publication Date: 2008-10-29MUDANJIANG NORMAL UNIV
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
MUDANJIANG NORMAL UNIV
Publication Date
2008-10-29
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a method for producing high-quality nano-diamond film with low cost, which belongs to the superhard material growth field. The method takes hydrogen, argon and carbonaceous gas as the precursor gas, plasma is formed by utilizing hot cathode glow discharge excitation, the diamond film nucleation and growth can be alternately performed through controlling the gas supply proportion, the diamond crystal particles are controlled within the nanometer range, and high-quality nano-diamond film is deposited after mainly going through the process of nucleation, nano-diamond film deposition and removal of the non-diamond phase carbon on the surface of the film. The method for producing the high-quality nano-diamond film with low cost has the advantages of high excitation current, quick growth speed, high film forming quality and low preparation cost; the prepared nano-diamond film also has the advantages of low surface roughness, small friction coefficient and low electrical resistivity besides excellent physical and chemical properties of the conventional diamond; the surface grain size is 10 to 100 nm.
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Description

technical field

[0001] The invention belongs to the field of superhard material growth, and relates to a method for preparing a nano-diamond film. Background technique

[0002] Usually, the diamond film grown by chemical vapor deposition method (referred to as CVD) has almost the same properties as single crystal diamond. This kind of diamond film is composed of micron-scale (several microns to tens of microns) columnar polycrystals, and the growth surface is relatively rough. The high hardness and high wear resistance of diamond make it extremely difficult to flatten and polish the film; due to the resistivity of diamond Very high (resistivity 10 9 -10 16 ), and cannot be polished and cut by electric machining; the diaphragm has a large particle size, and it is difficult to make it into a small component with high shape accuracy. The disadvantages of micron-scale diamond films have seriously affected the applications of diamond films in machining, optics and electronics....

Claims

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