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Preparation of vitrified Ta2O5-TiO2 composite metal oxide vapor deposition material

A ta2o5-tio2, composite oxide technology, applied in metal material coating technology, vacuum evaporation coating, sputtering coating, etc., can solve the problems of prolonging the coating cycle, cumbersome operation, increasing production costs, etc., and achieve growth saving Low cost, good repeatability and low cost effect

Inactive Publication Date: 2011-08-24
昆山光铭光电子元件有限公司
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  • Abstract
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  • Claims
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Problems solved by technology

Therefore, when used as the starting material for evaporation, it must be fully melted with electron beams in the vacuum coating chamber for a long time before evaporation, so as to prevent the splashing of tiny particles during evaporation and eliminate the residual gas contained in the material. Make the operation cumbersome, prolong the coating cycle and increase the production cost

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  • Preparation of vitrified Ta2O5-TiO2 composite metal oxide vapor deposition material
  • Preparation of vitrified Ta2O5-TiO2 composite metal oxide vapor deposition material

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Embodiment Construction

[0020] Will prepare Ta according to the weight ratio 2 o 5 (70%-90%) and TiO 2 (10%-30%) mixed oxide powder is placed in a vacuum furnace (crucible), at ≤1×10 -2 The mixed oxide powder is heated to 1800°C by a high-frequency source under Pa vacuum, melted in a vacuum furnace (crucible) and supplemented with a deep cryogenic trap trap of ≤ -120°C to capture the moisture and moisture in the powder. Other residual gas, while slowly cooling through the crucible (falling speed 5-10mm / h), finally get pre-melted crystallized Ta 2 o 5 -TiO 2 Composite oxide products.

[0021] Since the composite oxides are refractory high-temperature materials, they cannot be fused to grow crystals in a crucible made of high-melting-point metal materials. Therefore, the present invention directly uses the Ta 2 o 5 and TiO 2 The mixed oxide raw material itself is used as the crucible material, and the inside of the crucible is fully melted with a high-frequency power source in a vacuum furnace...

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Abstract

The invention discloses a method for preparing a crystalloid Ta2O5-TiO2 composite metal oxide vapor plating material comprising preparing mixed oxide powders of 70%-90% of tantalum pentaoxide and 10%-30% of titanium dioxide by weight percentage in a high vacuum high frequency furnace crucible, heating the mixed powders till 1800 DEG C by means of high frequency source under a vacuum less than or equal to 1*10<-2>Pa, forming Ta2O5-TiO2 composite oxide molten mass, slowly sedimenting and cooling the molten mass with a certain sedimentation rate to form pre-molten crystalloid Ta2O5-TiO2 composite oxide vapor plating material. The vapour and residual gas arisen during the preparation process are trapped by a cold trapper at a deep cold temperature less than or equal to -120 DEG C. The invention prepares pre-molten crystalloid Ta2O5-TiO2 composite oxide using slow sedimentation crystal growth method in a high vacuum high frequency furnace crucible. The product of the invention is the high pure and density original evaporating material used in the vapor plating advanced optical film with a low cost and reliable quality.

Description

technical field [0001] The invention relates to a method for preparing an evaporation coating material, in particular to a crystallized Ta 2 o 5 -TiO 2 A method for preparing a composite metal oxide evaporation material. Background technique [0002] With the rapid development of the application field of optical coating and the demand for higher performance of optical thin film, in addition to strictly controlling the coating process, the evaporation starting material and its preparation technology have become a very critical issue. For example, it is required that the evaporation material will not have particle splashing, no outgassing gas during the evaporation process, and it can be used stably and with good repeatability. For this reason, homogeneous evaporation materials with high purity, high density and specific refractive index have been continuously developed and applied. However, optical thin films deposited from simple oxides often have large internal stress, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24C04B35/50C23C14/08C04B35/622
Inventor 许士荣
Owner 昆山光铭光电子元件有限公司
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