Method for preparing super-clean and high-purity acetic acid and apparatus thereof

Abstract

The invention relates to a method for preparing super-clean high-purity acetic acid, and the high-purity acetic acid is mainly suitable for cleaning and corrosion in the manufacture industry of large scale integrated circuit semiconductor devices in the microelectronic industry. The method is as follows: firstly, the industrial grade acetic acid (99.0 percent) material is mixed with potassium permanganate with 0.1-0.5 percent of the weight of the acetic acid material in an oxidation processor; the mixture is filtered after 30-60 minutes under the normal temperature and pressure; the filtrate and a silicone polymer complexing agent of the bi-allyl 18-coronary-6 ether are mixed in a complexing processor for 30-120 minutes, and then the mixture is filtered by the microfiltration membrane of a microstrainer under the operation pressure of 0.1-0.2MPa; the filtrate passes through a 2,000mm dehydration column, and then enters a multi-level rectification tower with the speed of 0.05-0.20mm/s, and the semi-finished product yielded from the tower enters a product acceptor after the filtration by the nanofiltration membrane of a nanofiltration device under the operation pressure of 0.5-0.8MPa. The method has the advantages of simple process, low production cost, high product purity and low content of impurity ion. The device has the advantages of small occupied area, convenient automatic operation, stable quality and continuous production.

Description

(1) Technical field [0001] The invention relates to a method and device for producing ultra-high-purity acetic acid. High-purity acetic acid is mainly used in the microelectronics industry to manufacture large-scale integrated circuit semiconductor devices for cleaning and corrosion. It belongs to the technical field of microelectronic chemical reagents. (2) Background technology [0002] With the rapid development of semiconductor technology, the requirements for ultra-clean and high-purity reagents are getting higher and higher. In the processing of integrated circuits (IC), ultra-clean and high-purity reagents are mainly used for cleaning and etching the surface of chips and silicon wafers. Their purity and cleanliness have a great influence on the yield, electrical performance and reliability of integrated circuits. significant impact. [0003] Ultra-clean and high-purity acetic acid is a very important microelectronic chemical reagent. It is usually purified and refi...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the high-purity acetic acid product index that prior art produces is lower than the chemical material part 12 grades (SEMI-C12) standard that International Semiconductor Equipment and Materials Organization formulates, the deficiency that quality can not satisfy integrated circuit processing requirement, provides a A preparation method and device for ultra-clean high-purity acetic acid with strong process continuity, good separation effect, high purity and low impurity content

Images