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Method for producing photon crystal film for improving mechanical strength and solvent resistance

A technology of photonic crystals and solvent resistance, applied in chemical instruments and methods, crystal growth, optics, etc., can solve problems such as narrow application range, and achieve the effect of enhancing mechanical properties and enhancing solvent resistance

Active Publication Date: 2010-08-25
INST OF CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of method needs to prepare photonic crystal thin films from specially designed latex particles with hard core-soft shell structure, so the application range is very narrow.

Method used

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  • Method for producing photon crystal film for improving mechanical strength and solvent resistance
  • Method for producing photon crystal film for improving mechanical strength and solvent resistance
  • Method for producing photon crystal film for improving mechanical strength and solvent resistance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Pour the polystyrene-methyl methacrylate-acrylic acid triblock copolymer latex pellet emulsion with a mass concentration of 0.2% and a particle size of about 150nm into a small beaker, and insert a clean ordinary glass sheet vertically into it , The water is slowly evaporated in a constant temperature and humidity box with a temperature of 80% and a humidity of 80%, and an opal-type polystyrene-methyl methacrylate-acrylic acid triblock copolymer photonic crystal is obtained on the glass sheet film.

[0028] An ordinary glass sheet with an opal-type structure of polystyrene-methyl methacrylate-acrylic acid triblock copolymer photonic crystal film is immersed in acrylamide with a mass concentration of 5% and diethoxy with a mass concentration of 0.1%. Benzenehexanone, 0.1% by mass concentration of N,N'-methylenebisacrylamide in an aqueous solution for 5 minutes, dry the side without the photonic crystal film, and then cover the side with the opal structure of the photonic cr...

Embodiment 2

[0034] Pour the polystyrene latex pellet emulsion with a mass concentration of 1% and a particle size of about 240nm into a small beaker, insert a clean ordinary glass sheet vertically into it, and set the temperature to 60°C and humidity to 60% The water is slowly evaporated in the constant temperature and humidity box, and a polystyrene photonic crystal film with an opal structure is obtained on a common glass sheet.

[0035] A common glass sheet with a polystyrene photonic crystal film with an opal structure on one side is immersed in a 2% mass concentration of acrylamide, a mass concentration of 0.06% diethoxyphenhexanone, and a mass concentration of 0.06% N. In the N'-methylenebisacrylamide aqueous solution for 10 minutes, dry the side without the photonic crystal film, and then cover the side of the photonic crystal film with the opal structure on another piece of clean ordinary glass and irradiate it with a UV lamp The photonic crystal film sandwiched between two ordinary ...

Embodiment 3

[0041] Pour the ethanol emulsion of silica latex particles with a mass concentration of 0.2% and a particle size of about 250nm into a small beaker, insert a clean ordinary glass sheet vertically into it, and slowly evaporate the ethanol in an oven at a temperature of 36°C , Obtain the opal-type silicon dioxide photonic crystal film on ordinary glass.

[0042] A common glass sheet with a silicon dioxide photonic crystal film with an opal-type structure on one side is immersed in an enamide with a mass concentration of 3%, diethoxyphenhexanone with a mass concentration of 0.03%, and N with a mass concentration of 0.03%. In the N'-methylenebisacrylamide aqueous solution for 1 minute, dry the side without the photonic crystal film, and then cover the side with the opal-shaped photonic crystal film on another piece of clean ordinary glass and irradiate it with a UV lamp The photonic crystal film sandwiched between two ordinary glass sheets polymerizes the polymer monomer; the wavelen...

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Abstract

The invention relates to a method for preparing a photonic crystal film which can improve the mechanical intension and the solvent resistance. In the method, a polymer monomer solution which is adulterated with photoinitiator and cross linker can evenly permeate into interspaces of the photonic crystal film with an opal type structure, and then the film can be irradiated by ultraviolet light to make the polymer monomer polymerized; after the polymer monomer is polymerized, the emulsion particle bulbs in the photonic crystal film with an opal type structure can be jointed firmly, a polymer macromolecule net can be formed among the emulsion particle bulbs, the performance of the photonic crystal can be enhanced through utilizing the net structure which is formed by the polymer macromoleculechains, therefore, the mechanical performance of the photonic crystal film can be enhanced. Taking the rigidity of the film and Young modulus for example, the polymer monomer solution can permeate inthe interspaces of the photonic crystal film with an opal type structure, through the processing of photo-cross linking, the mechanical property of the rigidity of the photonic crystal film, the Young modulus and the like and the solvent resistance can be improved greatly, and the initial mechanical property can not be essentially affected.

Description

Technical field [0001] The invention relates to a method for preparing a photonic crystal film with improved mechanical strength and solvent resistance, and the method has universal applicability, has an effect of enhancing the mechanical strength of opal-type photonic crystal films prepared from various materials, and can significantly improve the opal Solvent resistance of type photonic crystal film. Background technique [0002] Photonic crystal materials, also known as photonic band gap (PBG) materials, are a type of artificial crystal with a photonic band gap structure composed of materials with different dielectric constants arranged periodically. The photonic crystal material can produce an energy frequency range. Light waves within this frequency range cannot pass through the medium to form a photonic forbidden band, so that it can effectively control the propagation of photons in three-dimensional space like semiconductors control electrons. This regulation of light dep...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J7/18G02B1/02C30B33/00C08L25/06C08L53/00
Inventor 田恩涛王京霞宋延林江雷
Owner INST OF CHEM CHINESE ACAD OF SCI
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