WS2/MoS2 solid lubrication multilayer film and method for making same

A solid lubricating, multi-layer film technology, applied in lubricating compositions, engine lubrication, solid diffusion coating, etc. problem, to achieve the effect of good nanomechanical properties, compact structure and novel structure

Active Publication Date: 2009-04-01
ACADEMY OF ARMORED FORCES ENG PLA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the "solid lubricant / metal" type nano-multilayer film also has a good solid lubrication effect, but because the metal in the multi-layer film is mainly used to help form the nano-multilayer film and the bonding strength between the nano-multilayer film and the substrate, It itself does not have solid lubricating properties, and it hinders the performance of solid lubricity in the nano-multilayer film, so the lubrication efficiency of the "solid lubricant / metal" type nano-multilayer film is not ideal

Method used

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  • WS2/MoS2 solid lubrication multilayer film and method for making same
  • WS2/MoS2 solid lubrication multilayer film and method for making same
  • WS2/MoS2 solid lubrication multilayer film and method for making same

Examples

Experimental program
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Effect test

Embodiment 1

[0054] (1) The substrate is quenched, the hardness is HRC55, and the surface roughness is 0.8 μm;

[0055] (2) The target material adopts a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. In a double-target RF sputtering device, W / Mo is made by alternately depositing a W layer and a Mo layer on the substrate. Multi-layer film, when the vacuum degree in the furnace reaches 2.5×10 -3 At this time, the inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.0 Pa to start sputtering. The current is 1.0A; the double-target radio frequency sputtering alternately deposits W layers and Mo layers to form a W / Mo multilayer film. The thickness of the film is determined by the residence time and deposition rate of the substrate before the target in the double-target radio frequency sputtering alternate deposition steps. Control, the target distance is 60mm, when depositing the W layer, the residence time of the substra...

Embodiment 2

[0075] (1) The substrate is quenched, the hardness is HRC55, and the surface roughness is 0.8 μm;

[0076] (2) The target material adopts a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. In a double-target RF sputtering device, W / Mo is made by alternately depositing a W layer and a Mo layer on the substrate. Nano multilayer film, when the vacuum degree in the furnace reaches 2.75×10 -3 Pa, the inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.1 Pa to start sputtering. The current is 1.5A; the double target radio frequency sputtering alternately deposits W layer and Mo layer to make W / Mo nanometer multilayer film thickness by the residence time and deposition rate of substrate in front of the target in the double target radio frequency sputtering alternate deposition step To control, the target distance is 70mm. When depositing the W layer, the residence time of the substrate in front of the W target ...

Embodiment 3

[0095] (1) The substrate is quenched, the hardness is HRC55, and the surface roughness is 0.8 μm;

[0096] (2) The target material adopts a W target with a purity of 90-99.95% and a Mo target with a purity of 90-99.95%. In a double-target RF sputtering device, W / Mo is made by alternately depositing a W layer and a Mo layer on the substrate. Nano multilayer film, when the vacuum degree in the furnace reaches 3.0×10 -3 Pa, the inert gas argon with a purity of 99.999% was introduced, and the pressure was controlled at 1.2 Pa to start sputtering. The current is 2A; the double-target radio frequency sputtering alternately deposits W layers and Mo layers to make a W / Mo nano-multilayer film. The thickness of the film is determined by the residence time and deposition rate of the substrate in front of the target in the double-target radio frequency sputtering alternate deposition steps. Control, the target distance is 80mm, when depositing the W layer, the residence time of the subst...

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Abstract

The invention provides a WS2/MoS2 solid lubricating multilayer film and a preparation method thereof, which firstly prepares a W/Mo multilayer film through double-target RF sputtering and a W layer and an Mo layer are deposited alternatively on a substrate, and then low temperature ion sulfurizing is carried out to the W/Mo multilayer film and the WS2/MoS2 solid lubricating multilayer film is prepared. The invention prepares a novel solid lubricating film, namely, the WS2/MoS2 solid lubricating nano multilayer film through two-step compound treatment. The sublayers of the WS2/MoS2 solid lubricating nano multilayer film have the same thickness and element sulfur is distributed evenly in the multilayer film, thus leading the multilayer film to have higher rigidity, good nano properties, elasticity modulus and yield strength, better practicability and excellent anti-friction and wear-resistant properties in nano mechanical properties and anti-friction and wear-resistant aspects as being compared with the existing nano multilayer films. The WS2/MoS2 solid lubricating multilayer film can be used on various friction surfaces of machinery equipment, particularly on precisely matching surfaces to reduce friction and improve lubrication conditions.

Description

technical field [0001] The invention relates to a solid lubricating multilayer film, specifically a WS made of radio frequency sputtering and low temperature ion sulfurization using a two-step method. 2 / MoS 2 Solid lubricating multilayer film and its preparation method. Background technique [0002] Solid lubrication refers to the use of certain solid materials with a special crystal structure and low shear strength to improve the friction and wear between friction pairs. It is a powerful supplement to fluid lubrication and is used in aerospace, atomic energy, military and many industries. Departments have important applications. For mechanical equipment parts working under special working conditions such as high temperature, high pressure, high load, ultra-low temperature, ultra-high vacuum, strong oxidation, and strong radiation, solid lubrication will play an irreplaceable role in lubrication. [0003] Solid lubricating film, that is, a thin film deposited by solid lu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F16N15/00C10M103/06B32B33/00C23F17/00C21D1/18C23C14/16C23C14/34C23C8/36C23C14/54
Inventor 王海斗徐滨士朱丽娜康嘉杰庄大明张弓李国禄刘家浚
Owner ACADEMY OF ARMORED FORCES ENG PLA
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