Rosin diacid ester acetal polymer without aryl , process for synthesizing the same and use thereof

A technology of rosin diacid ester and acetal polymer, which is applied in the field of acetal polymer and its synthesis, and can solve the problems of increasing the difficulty of synthesis

Inactive Publication Date: 2009-05-27
BEIJING NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in order to enhance the plasma etching resistance of the photoresist film layer, the copolymer needs to introduce a large number of alicyclic structures, which increases the difficulty of synthesis

Method used

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  • Rosin diacid ester acetal polymer without aryl , process for synthesizing the same and use thereof
  • Rosin diacid ester acetal polymer without aryl , process for synthesizing the same and use thereof
  • Rosin diacid ester acetal polymer without aryl , process for synthesizing the same and use thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 2

[0039] Reference Example 2 Preparation of abietic acid dimer

[0040] Add 150 g of commercially available extra-grade rosin, 250 ml of 95% ethanol and 10 ml of concentrated hydrochloric acid into a 500 ml single-necked flask. Heat to reflux for 3 hours, cool to 0°C, let stand for 4 to 5 hours, collect the precipitated solid, wash with distilled water until the washing liquid is neutral, and dry to obtain 75g of abietic acid, wherein the content of abietic acid is close to 95%.

[0041] Add 50g of the abietic acid prepared above into a 500ml three-neck flask, add 60ml of toluene, and stir to dissolve at room temperature. The temperature was controlled at about 40°C, and a mixture of 5ml of concentrated sulfuric acid and 1ml of glacial acetic acid was added dropwise over 1.5 hours, and the reaction was continued for 2.5 hours to complete. Add 200ml of toluene to dilute and let stand for 4 hours to separate the layers. Separate the organic phase and wash it with 0.5% hot (60...

Embodiment 1

[0042] Example 1 Propylenepimaric Acid Reaction with 1,4-Divinyloxymethylcyclohexane (Cyclohexyl Dimethanol Divinyl Ether)

[0043] Add 37.4g (0.1mol) of propylene pimaric acid and 19.6g (0.1mol) of 1,4-divinyloxymethyl ring from reference example 1 in the 500ml four-neck flask equipped with mechanical stirring, thermometer and condenser Add 60ml of xylene to hexane (cyclohexyl dimethyl divinyl ether), heat and stir to dissolve it, raise the temperature to 120-130°C, and stir for 3 hours to complete the reaction.

[0044] Product Determination Infrared Spectrum Visible 3400cm -1 Absorption of nearby carboxylic acids basically disappears, 1690cm -1 Carbonyl absorption of nearby carboxylic acid disappears, 1720cm -1 The carbonyl absorption of the ester group occurs nearby. Indicates that the reaction is complete.

[0045] Example 2 Reaction of Propylene Pimaric Acid with Divinyloxyethyl Ether (Diethylene Glycol Divinyl Ether)

[0046] Add 37.4g (0.1mol) of propylene p...

Embodiment 3

[0048] Example 3 Reaction of Dimeric Abietic Acid with 1,4-Divinyloxymethylcyclohexane (Cyclohexyl Dimethanol Divinyl Ether)

[0049] Add 59.1g (0.1mol) of abietic acid dimer and 19.6g (0.1mol) of 1,4-divinyloxymethyl from reference example 2 in the 500ml four-necked bottle equipped with mechanical stirring, thermometer, and condenser Base cyclohexane (cyclohexyl dimethyl divinyl ether), add 80ml of xylene, heat and stir to dissolve it, heat up to 120-130°C, and stir for 3 hours to complete the reaction.

[0050] Product Determination Infrared Spectrum Visible 3400cm -1 Absorption of nearby carboxylic acids basically disappears, 1690cm -1 Carbonyl absorption of nearby carboxylic acid disappears, 1720cm -1 The carbonyl absorption of the ester group occurs nearby. Indicates that the reaction is complete.

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Abstract

The invention relates to a rosin diacid ester acetal polymer containing no aryl, and a synthesis method thereof. Rosin diacid comprises propylene pimaric acid and abietic acid dimer, wherein the two acids and various fatty diol divinyl ether compounds are heated and react in the presence of organic solvent so as to obtain a novel ester acetal polymer. As the polymer is easy to undergo acid-caused decomposition reaction, the acetal polymer together with an optical acid production agent can form a novel chemically-amplified positive photoresist material.

Description

technical field [0001] The technical field of the present invention is the field of polymer materials, that is, a new type of acetal polymer and its synthesis method. Specifically, rosin diacid and aliphatic diol divinyl ether compounds react under certain conditions to form acetal polymers. Such polymers are prone to acid-induced decomposition reactions, so they can be used together with photoacid generators to form chemical amplification. photosensitive imaging material. This new type of photosensitive imaging material can be used for ultraviolet positive photoresist (also known as photoresist) for VLSI and photosensitive and thermal imaging composition for computer-to-plate (CTP) printing. Background technique [0002] The imaging principle of a common photoresist is to protect alkali-soluble groups such as phenolic hydroxyl groups and carboxyl groups into acid-dissociable groups, such as ester groups or acetals. These acid-dissociable groups decompose under the action ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G8/34
Inventor 王力元霍永恩
Owner BEIJING NORMAL UNIVERSITY
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