Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Hard coating excellent in sliding property and method for forming same

A hard film and sliding technology, applied in the direction of ion implantation plating, coating, metal material coating technology, etc., can solve the problems of insufficient burning resistance, insufficient use, poor burning resistance, etc., to achieve friction Reduced carbon content, increased carbon content, and excellent wear resistance

Inactive Publication Date: 2009-06-10
KOBE STEEL LTD
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Patent Document 1, although the film composed of a composite nitride containing at least two metal nitrides among nitrides of Cr, Ti, Al, and V is High hardness, excellent wear resistance, but insufficient seizing resistance, and not good enough for use in severe environments such as plastic processing with high surface pressure
In addition, the underlayer described in Patent Document 2 is formed with one or more of nitrides, carbides, and carbonitrides mainly composed of one or more metal elements selected from among Ti, V, Cr, Al, and Si. On the surface of the base layer, an outermost film mainly composed of Ti, V, Cr, Al, Si, and Cu is formed. Like the film described in Patent Document 1, it has high hardness and excellent wear resistance, but Poor burning resistance
In addition, although the coatings described in Patent Document 3 and Patent Document 4 are provided with a surface layer made of sulfide for improving seizing resistance, the sulfide is relatively soft and has excellent sliding properties at the beginning of use. A bit true, but it decays over time, long-term durability is an issue

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hard coating excellent in sliding property and method for forming same
  • Hard coating excellent in sliding property and method for forming same
  • Hard coating excellent in sliding property and method for forming same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0095] Using a metal target composed of metal element M or a composite target composed of metal elements M and B, using figure 1 In the cathode discharge type arc ion plating apparatus shown, films having the respective compositions shown in Table 1 were formed on the substrate surface. In this Example 1, first, in order to confirm the composition of the coating and measure the hardness of the coating, a cemented carbide whose surface was mirror-polished was used as a substrate, and coatings of the compositions shown in Table 1 were formed on the surface. In addition, as a sliding test, an SKD11 substrate (hardness HRC60) was used as the base material. In order to improve the adhesion to the surface of the base material, after forming a CrN layer with a thickness of 3 μm, the surface of each layer shown in Table 1 was formed on the surface. composed of membranes.

[0096] Initially, these substrates were placed on the substrate platform of the arc ion plating device, and then...

Embodiment 2

[0117] As the metal element M, Ti is used as the metal target, the same as in Example 1, using such as figure 1 The cathode discharge type arc ion plating device shown makes the arc current, methane (CH 4 ) The partial pressure was varied as shown in Table 2, and a superhard alloy whose surface was mirror-polished was used as a base material, and a hard film was formed on the surface. Also, the arc evaporation source used, that is, the evaporation source, is figure 2 shown using evaporation source A, image 3 shown using evaporation source B, Figure 4 The three shown use evaporation source C. The substrate voltage during film formation was 200V.

[0118] Also, in Example 2, only Ar and methane (CH 4 ) gas, other experimental conditions follow the experimental conditions of embodiment 1 to carry out. Confirmation of the component composition of the film was analyzed by an electron beam microanalyzer (EPDA). The results of its analytical confirmation are shown in Table ...

Embodiment 3

[0128] The metal element M is W, and W composed of WC is used as a target 0.5 C 0.5 Target (hot pressed product ￠100mm), with figure 1 In the shown cathode discharge type arc ion plating apparatus, a hard film containing W is formed on the surface of the substrate.

[0129] As the conditions for forming a hard film containing W, the arc current was 150A, methane (CH 4 ) flow ratio at 0 to 30vol%, nitrogen (N 2 ) The flow rate ratio is changed between 0 and 30vol%, and then Ar is supplied into the vacuum container to adjust the total pressure to 1.33Pa. In the case of No. 15 to 17 with added B, supply B into the vacuum container 2 h 6 gas. The film forming temperature was 400°C, and the bias voltage was 100V.

[0130] The film thickness of the formed hard film containing W was 10 μm, and the crystal structure of this film was identified by X-ray diffraction. The conditions for X-ray diffraction were to use Cukα as a line source, and measure the region of 10° to 100° by ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
hardnessaaaaaaaaaa
friction coefficientaaaaaaaaaa
Login to View More

Abstract

Disclosed is a hard coating excellent in wear resistance, insusceptible to seizure, and excellent sliding property even after use over the long term, and a method capable of forming the hard coating excellent in sliding property in a short time. The hard coating is a hard coating expressed by chemical formula MxBaCbNc, wherein M is at least one kind of metallic element selected from the group consisting of elements in the groups 4A, 5A, and 6A of the periodic table, and Si, Al, the hard coating having chemical composition satisfying respective formulas expressed by 0<=a<=0.2, 0<=c<=0.2, 0<x-a-c, x-a-c<b<=0.9, 0.05<=x<=0.5, and x+a+b+c=1, where x, a, b, and c denote respective atomic ratios of M, B, C, and N.

Description

technical field [0001] The present invention relates to, for example, a hard film formed on the surface of a metal mold for metal forming, a jig for metal processing, etc., which has excellent sliding properties, and also relates to a method for forming the hard film. Background technique [0002] Conventionally, for metal molds for metal forming and jigs for metal processing, improvement of wear resistance and seizing resistance by nitriding treatment have been promoted. In recent years, instead of this nitriding treatment, improvement of wear resistance and seizing resistance has been studied by vapor phase coating such as PVD. [0003] For example, the technique described in Patent Document 1 is to form a film composed of a composite nitride containing at least two kinds of metal nitrides among nitrides of Cr, Ti, Al, and V to improve sliding properties. In addition, the techniques described in Patent Document 2 and Patent Document 3 form one of nitrides, carbides, and c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35
CPCC23C14/0664C23C14/24C23C14/325C23C14/54
Inventor 山本兼司
Owner KOBE STEEL LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com