Method and device for removing cadmium and thallium from high purity indium production

A high-purity, production process technology, applied in the field of high-purity indium production, can solve the problems of long operation time, high production cost, large environmental pollution, etc., and achieve the effects of simple equipment processing, fast production speed and high product purity

Inactive Publication Date: 2009-06-17
ZHUZHOU KENENG NEW MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The iodine added in the smelting is also easy to sublimate, and the iodine vapor is very toxic
This method is more polluting to the environment, the operation time is long,

Method used

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  • Method and device for removing cadmium and thallium from high purity indium production
  • Method and device for removing cadmium and thallium from high purity indium production
  • Method and device for removing cadmium and thallium from high purity indium production

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Embodiment Construction

[0014] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0015] The specific technological process of the present invention is: the first step, put indium into the crucible and put it into the vacuum tank, then place the cylindrical titanium plate on the crucible cover, cover the titanium sealing sleeve, close the vacuum tank cover, open Water cooling system, start the vacuum pump; control the vacuum degree below 10Pa; the second step, control the temperature at the bottom of the crucible at 400-1000 degrees, keep it warm for 1-5 hours, completely volatilize the cadmium and thallium impurities, and finally leave the high-purity indium in the Crucible, to achieve the purpose of purification.

[0016] Figure 1, figure 2 As shown, the present invention contains a cooling water circulation device 1, a well-type electric furnace 2, a vacuum tank 3, a vacuum pump 4, an electric screen cabinet 5 and a tra...

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Abstract

The invention relates to a method for removing cadmium and thallium impurities in the process of producing high purity indium and an apparatus thereof, belonging to the smelting field of high purity non ferrous metal in smelting industry. The specific procedures of the invention are as follows: firstly, putting indium into a crucible and loading the crucible in a vacuum tank, disposing a cylindrical titanium plate on the lid of the crucible, covering a titanium sealing sleeve, folding the cover of the vacuum tank, starting up a water cooling system, and launching a vacuum pump; controlling degree of vacuum below 10 Pa; secondly, controlling temperature of the crucible bottom range from 400 to 1000 DEG C, implementing heat preservation for 1 to 5 hours, volatilizing cadmium and thallium impurities completely, and eventually, remaining the high purity indium in the crucible, thus achieving the objective of purification. The invention has the advantages of fast production speed, low power consumption, simple apparatus processing, and is applicable for large-scale production. As the addition of chemical reagents is not required in the production process, purity of the product is high and the production process is free from pollution and discharge of pollutants.

Description

technical field [0001] The invention relates to a method and a device for producing high-purity indium, belonging to the field of high-purity nonferrous metals in the smelting industry. Background technique [0002] Due to its good light permeability and conductivity, indium is mainly used in the production of ITO targets (for the production of liquid crystal displays and flat panel screens). This use is the main application field of indium, accounting for 70% of the global indium consumption. Several other consumption areas are: electronic semiconductor field, accounting for 12% of global consumption; solder and alloy field accounting for 12%; research industry accounting for 6%. In the application of indium, its purity is required to be above 99.995%, and impurity elements such as cadmium and thallium are required to be below 0.0005%. [0003] The process of purifying crude indium from 98% to 99.99% is mainly electrolysis, but because the potential of cadmium and thallium...

Claims

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Application Information

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IPC IPC(8): C22B58/00C22B9/02
Inventor 赵科湘赵科峰
Owner ZHUZHOU KENENG NEW MATERIAL CO LTD
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