Nonaqueous non-abrasive polishing solution for soft, crisp and deliquescent crystal

A non-abrasive polishing liquid and deliquescent technology, which is applied in the direction of polishing composition, chemical instruments and methods, can solve the problems of inability to obtain ultra-smooth and high-integrity surfaces, unfavorable material removal rate, abrasive embedding, etc., to achieve non-volatile, Long service life and good stability

Active Publication Date: 2009-07-15
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For soft, brittle and deliquescent KDP crystals, the use of traditional water-based abrasive polishing fluids is not conducive to controll

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0014] Example 1: Select polishing solution A (60% dodecanol, 12% deionized water, 28% polyethylene glycol octylphenyl ether) for KDP crystal polishing experiment: the pressure is 90kPa, and the rotation speed of the polishing disk is 100r / min , The polishing liquid flow rate is 10ml / min. After polishing for 20 minutes, the measured surface roughness was 1.73nm rms; the removal rate was 458.7nm / min.

Example Embodiment

[0015] Example 2: Select polishing solution B (54% dodecanol, 16% deionized water, 30% polyethylene glycol octylphenyl ether) for KDP crystal polishing experiment: the pressure is 90kPa, and the rotation speed of the polishing disk is 100r / min , The polishing liquid flow rate is 10ml / min. After polishing for 10 minutes, the measured surface roughness was 3.774nm rms; the removal rate was 823.7nm / min.

Example Embodiment

[0016] Example 3: Select polishing liquid C (45% dodecanol, 20% deionized water, 35% polyethylene glycol octylphenyl ether) for KDP crystal polishing experiment: the pressure is 90kPa, the rotation speed of the polishing disk is 100r / min , The polishing liquid flow rate is 10ml / min. After 8 minutes of polishing, the measured surface roughness was 10.87nm rms; the removal rate was 1831.2nm / min.

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PUM

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Abstract

The invention discloses a nonwater-based grinding-medium-free chemical mechanical polishing solution adapted to polishing crispy and easily deliquescent crystal. The components of the polishing solution are as below in terms of weight percentage: 40-65% of oil phase, 10-22% of deionized water, and the balance of surface active agent. The oil phase is alcohol or ester, and the surface active agent can adopt high-carbon fatty alcohol polyethenoxy ether, polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether or polyoxyethylate amide of a non-ionic surface active agent. The invention has the advantages of simple polishing solution preparing method, good fluidity, no toxicity, no pollution, no corrosion, good stability, no easy volatilization and long service life. The surface of a polished sample has a roughness concentration which can be up to 1.7 nm, is free from such defects as scratch, damage, and the like, and can be permanently stored at the room temperature in the airtight condition.

Description

technical field [0001] The invention relates to a polishing liquid for chemical mechanical polishing, in particular to a chemical mechanical polishing liquid for soft, brittle and deliquescent functional crystals. Background technique [0002] With the upcoming operation of the National Ignition Facility (NIF) in the United States and the start of the Shenguang-III laser inertial confinement fusion device in my country, the soft, brittle and deliquescent potassium dihydrogen phosphate crystal (KDP crystal) is an irreplaceable frequency doubling crystal and Electro-optic switching elements have received more and more attention. How to obtain ultra-smooth and high-integrity surfaces and large-size crystals with high resistance to laser damage threshold has become a hot topic of research by many scholars. However, its soft, brittle and easily soluble in water make KDP crystal an extremely difficult material to process. At present, domestic and foreign research institutes use d...

Claims

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Application Information

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IPC IPC(8): C09G1/18
Inventor 高航王碧玲郭东明康仁科
Owner DALIAN UNIV OF TECH
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