Nonaqueous non-abrasive polishing solution for soft, crisp and deliquescent crystal
A non-abrasive polishing liquid and deliquescent technology, which is applied in the direction of polishing composition, chemical instruments and methods, can solve the problems of inability to obtain ultra-smooth and high-integrity surfaces, unfavorable material removal rate, abrasive embedding, etc., to achieve non-volatile, Long service life and good stability
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Embodiment 1
[0014] Embodiment 1: choose polishing solution A (60% dodecyl alcohol, 12% deionized water, polyethylene glycol octyl phenyl ether 28%) to carry out KDP crystal polishing experiment: pressure is 90kPa, and the rotating speed of polishing disk is 100r / min , the polishing liquid flow rate is 10ml / min. The measured surface roughness was 1.73nm rms after polishing for 20 minutes; the removal rate was 458.7nm / min.
Embodiment 2
[0015] Embodiment 2: choose polishing solution B (dodecanol 54%, deionized water 16%, polyethylene glycol octyl phenyl ether 30%) to carry out KDP crystal polishing experiment: pressure is 90kPa, and the rotational speed of polishing disk is 100r / min , the polishing liquid flow rate is 10ml / min. The surface roughness measured after polishing for 10 minutes was 3.774nm rms; the removal rate was 823.7nm / min.
Embodiment 3
[0016] Embodiment 3: choose polishing solution C (dodecyl alcohol 45%, deionized water 20%, polyethylene glycol octyl phenyl ether 35%) to carry out KDP crystal polishing experiment: pressure is 90kPa, and polishing disk rotating speed is 100r / min , the polishing liquid flow rate is 10ml / min. The surface roughness measured after polishing for 8 minutes was 10.87nm rms; the removal rate was 1831.2nm / min.
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