Micro-nozzle and manufacture method thereof

Abstract

The invention discloses a micro-nozzle and a fabrication method thereof. A capillary tube of the micro-nozzle consists of a micro-pipe and a transitional pipe, and is embedded into one end of a plastic pipe; the micro-pipe is communicated with the environment outside the nozzle; the transitional pipe is communicated with the inner cavity of the plastic pipe; and the inside diameter of the transitional pipe is reduced gradually. The fabrication method of the micro-nozzle does not need to adopt micro-electromechanical processing technology and has fewer operating steps,,and common mechanical technicians can operate technologies such as die casting and corrosion and the like; therefore, the method is simple and reliable, and are easy to learn and master by operators; the circular-section plastic pipe of the micro-nozzle forms a fluid inlet tank which delivers fluid to the micro-pipe, simultaneously, macro-connection is formed between the fluid-inlet system and the capillary pipe so as tofacilitate the sealed connection with the common circular-section macro-fluid inlet pipes. Without any bending angles, fluid channels in the micro-nozzle are communicated straightly, which is easy for sample introduction, cleaning and drying.

Description

technical field [0001] The invention belongs to a micro-nozzle of an injection device for preparing microcapsules and micro-emulsions and a manufacturing method thereof. Background technique [0002] At present, through-type microchannel devices used in the preparation of microcapsules and microemulsions are mostly fabricated by microelectromechanical processing methods, and the general fabrication steps include mask fabrication, glue coating, exposure, corrosion, and glue removal. Typical a kind of microemulsification microchannel and manufacture method thereof as described in detail such as Isao Kobayashi mainly include the following steps: a) deposit a layer of 0.2 μm thick aluminum layer on the silicon substrate by the method of vapor deposition as A protective layer for deep ion etching; b) coating a layer of photoresist on this substrate; c) transferring the micropipe shape layout on the mask to the photoresist by ultraviolet exposure; d) developing the aluminum film ...

AI Technical Summary

Problems solved by technology

These equipment, especially the reactive ion etching equipment, are expensive, so the manufacturing cost of the micro-channel device is high; using this method to make the micro-channel device is complex and requires high requirements for the operator and the process environment

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