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Method for making silicone base integrable miniature glucose sensor

The technology of a glucose sensor and a manufacturing method is applied in the manufacturing field of silicon-based integratable micro-glucose sensor, and achieves the effects of favorable ion exchange reaction, simple preparation and low cost

Inactive Publication Date: 2009-08-19
EAST CHINA NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After extensively consulting domestic and foreign public publications and searching domestic and foreign patent documents, there is no use of silicon microchannels to produce low-cost, high-selectivity, high-sensitivity, high-reliability, rapid-response, platinum-free, non-enzyme glucose sensor reports

Method used

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  • Method for making silicone base integrable miniature glucose sensor
  • Method for making silicone base integrable miniature glucose sensor
  • Method for making silicone base integrable miniature glucose sensor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] 1. Fabrication of high aspect ratio macroporous silicon microchannels:

[0039] (1) Electrochemical process: Deposit Si on the surface of silicon substrate 3 N 4 Mask, photoetching the Si-MCP window position; take it out and clean it, and then use potassium hydroxide solution for 5 minutes of pre-etching treatment, and an inverted quadrangular truss structure can be formed in the window; use an electrochemical etching device, photocatalyze deep under the irradiation of a halogen lamp Corrosion 8h to form Si-MCP.

[0040] (2) Structure protection: the prepared Si-MCP was annealed at 500° C. in an argon atmosphere of RTA (rapid thermal annealing) system for 6 minutes to enhance the mechanical stability of the Si-MCP structure.

[0041] (3) Thinning of the back side: open a window on the back side, and use potassium hydroxide solution to etch the back side of the substrate until it meets the Si-MCP deep groove structure etched deeply on the front side of the substrate. ...

Embodiment 2

[0057] 1. Fabrication of high aspect ratio macroporous silicon microchannels:

[0058] (1) Electrochemical process: Deposit Si on the surface of silicon substrate 3 N 4 Mask, photoetching the position of Si-MCP window; take it out and clean it, and then use potassium hydroxide solution to pre-etch for 2 minutes, and an inverted quadrangular truss structure can be formed in the window; use an electrochemical etching device, photocatalyze deep under the irradiation of a halogen lamp Corrosion 6h to form Si-MCP.

[0059] (2) Structure protection: the prepared Si-MCP was annealed in RTA (rapid thermal annealing) system at 300° C. for 6 min in an argon atmosphere to enhance the mechanical stability of the Si-MCP structure.

[0060] (3) Thinning of the back side: open a window on the back side, and use potassium hydroxide solution to etch the back side of the substrate until it meets the Si-MCP deep groove structure etched deeply on the front side of the substrate.

[0061] (4) U...

Embodiment 3

[0076] 1. Fabrication of high aspect ratio macroporous silicon microchannels:

[0077] (1) Electrochemical process: Deposit Si on the surface of silicon substrate 3 N 4 Mask, photolithographic Si-MCP window position; take it out and clean it, and then pre-etch with tetramethylammonium hydroxide solution for 3 minutes, and an inverted quadrangular truss structure can be formed in the window; using an electrochemical etching device, under the irradiation of a halogen lamp Photocatalytic deep etch for 10h to form Si-MCP.

[0078] (2) Structure protection: the prepared Si-MCP was annealed at 400° C. in an argon atmosphere of RTA (rapid thermal annealing) system for 6 minutes to enhance the mechanical stability of the Si-MCP structure.

[0079] (3) Thinning of the back side: open a window on the back side, and use potassium hydroxide solution to etch the back side of the substrate until it meets the Si-MCP deep groove structure etched deeply on the front side of the substrate.

...

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Abstract

The invention belongs to a micro-biosensor and particularly relates to a manufacturing method of a silica-based integratable micro-glucose sensor. The existing glucose sensor takes a glucose oxidase electrode as a device for molecular recognition and signal conversion, thus having poor stability and restricting the application of the glucose sensor on the basis of enzyme. The manufacturing method comprises the following steps of: manufacturing a silicon micro-channel by using a P-typed single-side polishing silicon wafer through electrochemical etching; depositing the silicon micro-channel in eletroplating solution without electricity at the temperature of 80 DEG C for 30-45 minutes; and taking out and washing the silicon micro-channel with deionized water, and obtaining the silica-based integratable micro-glucose sensor. The invention has the advantages that: the electrochemical process is adopted, the cost is low, and the operation is simple; the micro-channel has even porosity, and the ratio of the specific surface area to the depth is big; the eletroplating solution without electricity has simple preparation and low price; no influence on the glucose test is generated; three-dimensional structure is beneficial to the contact between the glucose and active substances, and the improvement of the oxidation current; and the micro-biosensor is beneficial to the exchange reaction of ions and is miniaturized and integrated, thus being beneficial to large-scale production.

Description

technical field [0001] The invention belongs to miniature biosensors, in particular to a manufacturing method of a silicon-based integrated miniature glucose sensor for measuring glucose content. technical background [0002] High-efficiency and reliable detection of glucose content in blood, urine and food is very important to human health, so making glucose sensors with high selectivity, high sensitivity, high reliability, rapid response and low cost is a constant challenge pursuit of goals. Existing glucose sensors use glucose oxidase electrodes as devices for molecular recognition and signal conversion. It can promote the oxidation of glucose by detecting the reaction product H 2 o 2 The oxidation current is used to quantitatively analyze the glucose content in the sample to be tested. The performance of this type of sensor depends on the catalysis of glucose oxidase, but the activity of the enzyme changes with time and the environment, and generally decreases with t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/327B81C1/00B81B7/02B81C5/00B81C99/00
Inventor 王连卫苗凤娟陶佰睿
Owner EAST CHINA NORMAL UNIV
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