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Method for burning organic silicon waste gas and recycling diluted hydrochloric acid

A technology of dilute hydrochloric acid and organic silicon, applied in the direction of combustion methods, incinerators, combustion types, etc., can solve the problem of low reuse value of dilute hydrochloric acid, achieve the effect of improving reuse value, better dust removal effect, and broadening the application field

Inactive Publication Date: 2010-12-22
SEDIN NINGBO ENG
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in the dilute hydrochloric acid that this method reclaims, the content of nano-scale silica particles is higher, about 1-5% (wt), so dilute hydrochloric acid reuse value is lower

Method used

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Embodiment

[0008] A method for incinerating organic silicon waste gas and recovering dilute hydrochloric acid. The organic silicon waste gas is incinerated into flue gas at high temperature (above 1000 degrees) in an incinerator. The incinerated flue gas first passes through a waste heat boiler to recover heat energy, and the temperature of the flue gas that comes out drops. to about 250°C, and then pass the flue gas at about 250°C through a high-efficiency dust collector, so that the silica particles in the flue gas will be dry-adsorbed for 3-5 minutes. The dust removal effect of the flue gas is better, and most of the silica particles Impurities such as silicon particles are separated from the flue gas. After many tests, the high-efficiency dust collector can withstand a temperature of about 250°C; then the quench tower cools to recover heat energy, and the falling film absorber circulates dilute hydrochloric acid to absorb HCl in the flue gas, and the hydrogen chloride is diluted. Hydr...

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PUM

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Abstract

The invention discloses a method for burning organic silicon waste gas and recycling diluted hydrochloric acid. The recyclable diluted hydrochloric acid is obtained by the steps of burning at high temperature in an incinerator, recycling in a waste heat boiler, dedusting by a high-efficient deduster, cooling in a quench tower and absorbing in a falling film absorber, wherein the high-efficient deduster is a PCHD type high-efficient deduster manufactured by Tianci Dedusting Device Plant, Fujian. In the invention, a high-efficient deduster drying method is utilized for adsorption and dedusting and can be used for removing a great part of most silica granules and other impurities in gas; and then the quench tower is used for cooling smoke. The invention has good dedusting effect compared with the prior art adopting the steps of firstly cooling smoke by the quench tower, and then spraying and dedusting by utilizing a circular diluted hydrochloric acid wet method of a Venturi and a gas-liquid separator. The content of nanosilica granules in the recycled diluted hydrochloric acid granules is reduced to be lower than 10ppm, the reuse value of the recycled diluted hydrochloric acid is enhanced, and the application field of the high-efficient deduster is widened.

Description

technical field [0001] The invention relates to the treatment of organic silicon waste gas, in particular to a method for incinerating organic silicon waste gas and recovering dilute hydrochloric acid. Background technique [0002] Organic silicon waste gas and waste liquid mainly include toxic organic substances such as methyl chloride and methylchlorosilane monomer, which must be incinerated into carbon dioxide, silicon dioxide and hydrogen chloride, and then discharged after dust removal and recovery. At present, the method of organic silicon waste gas incineration and dilute hydrochloric acid recovery is 1. High temperature incineration in incinerator: the organic silicon waste gas is incinerated into flue gas at high temperature (above 1000 degrees) in the incinerator. The flue gas components include hydrogen chloride gas and nano-scale dioxide Silicon particles, etc.; 2. Waste heat boiler recovery: the flue gas first passes through the waste heat boiler to recover heat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F23G7/06C01B7/01
CPCY02P20/129
Inventor 王宇光厉相
Owner SEDIN NINGBO ENG
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