Mercaptan-alkene based high-precision ultraviolet imprinting method of continuous embossment micro optical elements
A micro-optical and high-precision technology, applied in optics, technology for producing decorative surface effects, microstructure technology, etc., can solve the problems of non-shrinkage resistance and achieve good anti-etching performance
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Embodiment 1
[0021] The mercaptan-alkene ultraviolet photoinitiated polymer material prepared by triallyl isocyanurate (TATATO), pentaerythritol tetrakis (3-mercaptopropionate) (PETMP) and photoinitiator Darocur 1173 was used as a resist The ultraviolet embossing process is carried out to produce a continuous relief structure micro-optical element, and the base material is quartz glass. The specific steps are:
[0022] a) Fill the prepared resist material between the stamper and the substrate, apply pressure to compress the substrate and the stamper, and adjust the pressure so that the thickness of the residual adhesive layer is about 500-1000nm.
[0023] b) Use a UV-LED light source to expose the filled resist, and then implement demoulding, and the obtained structure is as follows figure 2 As shown, the profile of the die structure is as figure 2 As shown, the shrinkage error of the micro-optical element with continuous relief structure is less than 3%.
[0024] c) The imprinted str...
Embodiment 2
[0026] Using ethylene glycol dimethacrylate (EGDMA), PETMP, and photoinitiator Darocur 1173 to prepare thiol-alkene UV photoinitiated polymer materials for UV imprinting process, to produce continuous relief structure micro-optical elements, the substrate material is Quartz glass. The specific steps are:
[0027] a) filling the prepared resist material between the stamper and the substrate, applying pressure to compress the substrate and the stamper, and adjusting the pressure so that the thickness of the residual adhesive layer is about 500-1000nm;
[0028] b) Use a UV-LED light source to expose the filled resist, and then implement demoulding, and the obtained structure is as follows Figure 4 As shown, the die structure is as Figure 4 As shown, the shrinkage error of the micro-optical element with continuous relief structure is less than 3%.
Embodiment 3
[0030] The mercaptan-alkene UV photoinitiated polymer material prepared by triallyl cyanurate (TTT), PETMP, and photoinitiator Darocur 1173 was used for UV imprinting process to produce continuous relief structure micro-optical elements and substrate materials For quartz glass. The specific steps are:
[0031] a) filling the prepared resist material between the stamper and the substrate, applying pressure to compress the substrate and the stamper, and adjusting the pressure so that the thickness of the residual adhesive layer is about 500-1000nm;
[0032] b) Use a UV-LED light source to expose the filled resist, and then implement demoulding, and the obtained structure is as follows Figure 4 As shown, the die structure is as Figure 4 As shown, the shrinkage error of the micro-optical elements with continuous relief structure is less than 3%.
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