Positive radiation-sensitive composition, interlayer insulating film and method for forming the same

A radiation and sensitivity technology, applied in the field of positive radiation-sensitive compositions, can solve the problems of high flatness obstacle and unevenness of the interlayer insulating film

Inactive Publication Date: 2011-08-17
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this series of steps, fine irregularities in the formation of unevenness caused by holes for vacuum adsorption may occur on the coating film, which becomes an obstacle to achieving the high level of flatness required as a property of an interlayer insulating film.

Method used

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  • Positive radiation-sensitive composition, interlayer insulating film and method for forming the same
  • Positive radiation-sensitive composition, interlayer insulating film and method for forming the same
  • Positive radiation-sensitive composition, interlayer insulating film and method for forming the same

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0199] In a container with a stirrer, after adding 25 parts by mass of propylene glycol monomethyl ether, add 30 parts by mass of methyltrimethoxysilane, 23 parts by mass of phenyltrimethoxysilane and 0.1 part by mass of aluminum tetraisopropoxide, Heat to a solution temperature of 60°C. After the solution temperature reached 60°C, 18 parts by mass of ion-exchanged water was added, heated to 75°C, and kept for 3 hours. Next, 28 parts by mass of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Then, the temperature of the solution was set to 40° C., and the solution was evaporated while maintaining the temperature to remove ion-exchanged water and methanol produced by hydrolytic condensation. As above, the hydrolysis-condensation product (A-1) was obtained. The solid content concentration of the hydrolytic condensate (A-1) was 40.5% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,500, and the molecular...

Synthetic example 2

[0201] In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 22 parts by mass of methyltrimethoxysilane, 12 parts by mass of γ-glycidoxypropyltrimethoxysilane, 20 parts by mass of Phenyltrimethoxysilane and 0.1 parts by mass of tetraisopropoxyaluminum were used in the same manner as in Synthesis Example 1 to obtain a hydrolysis condensate (A-2). The solid content concentration of the hydrolytic condensate (A-2) was 39.8% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,600, and the molecular weight distribution (Mw / Mn) was 2.

[0202] The [C] component is a copolymer formed from a monomer having a specific structure

Synthetic example 3

[0204] In a glass flask with a stirring device, a condenser and a thermometer, add 28.4 parts by mass of the compound shown in the above formula (c1-1) as (c1) compound, 20.7 parts by mass of Shin Nakamura Chemical ( Co., Ltd.), 18.1 parts by mass of a compound represented by the following formula (c3-1-1-1) as a (c3) compound, 5.9 parts by mass of acetone as a (c4) compound methyl acrylate and 23.5 parts by mass of 2-ethylhexyl acrylate, 3.4 parts by mass of the compound 1,4-butanediol as (c5) and 414 parts by mass of isoacrylate as the solvent. Propanol, in a nitrogen stream, under reflux, after adding 0.7 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator and 4 parts by mass of lauryl mercaptan as a chain transfer agent, at 75°C Copolymerization was carried out under reflux for 8 hours to obtain a solution containing a copolymer (C-1). Then, using an evaporator, the solvent is removed under heating conditions of 70° C. or lower, and the copolymer (C...

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Abstract

The invention relates to a positive radiation-sensitive composition, an interlayer insulating film, and a method for forming the same. The object of the invention is to provide a polysiloxanes positive radiation-sensitive composition capable of forming a highly smooth interlayer insulating film without uneven coating. The positive radiation-sensitive composition contains (A) siloxane polymer, (B) quinone diazide compound, and (C) copolymer of polymeric unsaturated compounds containing (c1) compound represented by the following formula (1), (c2) compound represented by the following formula (2) and (c3) polymeric unsaturated compound of a group represented by the following formula (3). (1) CH2=CR1COO-C<alpha>H2<alpha>-C<beta>F2 <beta> +1; (2) CH2=CR2COO-(C<gamma>H2<gamma>) a-R3.

Description

technical field [0001] The present invention relates to a positive type radiation-sensitive composition suitable as a material for forming an interlayer insulating film of display elements such as a liquid crystal display element (LCD) and an organic EL display element (OLED), and an interlayer insulation film formed from the composition. film and a method for forming the interlayer insulating film. Background technique [0002] In a display element, an interlayer insulating film is generally provided for the purpose of insulating between interconnections arranged in layers. A radiation-sensitive composition is widely used as a material for forming an interlayer insulating film. This composition is preferable because it requires fewer steps to obtain a required pattern shape and has sufficient flatness. [0003] In addition, the interlayer insulating film of the display element needs to be patterned with contact holes for wiring. Since it is difficult to form a contact hol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/075G03F7/00G03F7/008
CPCG03F7/0223G03F7/0392G03F7/0395G03F7/075H01L21/0273H01L21/0274
Inventor 一户大吾花村政晓
Owner JSR CORPORATIOON
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