Method for comprehensively testing stability of deep ultraviolet optical element

A deep-ultraviolet light, comprehensive testing technology, used in testing optical performance and other directions to save costs and improve measurement accuracy

Inactive Publication Date: 2011-09-07
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
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Problems solved by technology

Absorption loss mainly reflects the macroscopic characteristics of deep ultraviolet optical components, while laser-induced fluorescence intensity and spectral characteristics mainly reflect the microscop

Method used

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  • Method for comprehensively testing stability of deep ultraviolet optical element
  • Method for comprehensively testing stability of deep ultraviolet optical element
  • Method for comprehensively testing stability of deep ultraviolet optical element

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Embodiment Construction

[0033] Such as figure 1 As shown, the present invention adopts the comprehensive test device of surface thermal lens technology by deep ultraviolet excimer laser light source 1, beam shaping system 2, electronically controlled variable optical attenuator 3, focusing lens 4, electric optical shutter 5, laser power meter 6 , detection laser light source 7, reflector 8, adiabatic sample chamber 9, tested sample fixture and measured deep ultraviolet optical element sample 10, reference sample fixture and reference sample 11, sensitive temperature detection unit 12, fluorescence collection optical system 13, narrowband Optical filter 14, coupling optical fiber 15, monochromator 16, fluorescence photodetection device 17, aperture diaphragm 18, photodetector 19, bridge amplifier circuit 20, A / D converter 21 and 22, computer 23, Reflector 24 and light absorber 25 are composed. When the output wavelength of the deep ultraviolet excimer laser light source is lower than 200nm, the entir...

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Abstract

The invention relates to a method for comprehensively testing the stability of a deep ultraviolet optical element. The method comprises the following steps of: measuring the absorption loss absolute value of the deep ultraviolet optical element by adopting a laser calorimetry technology and calibrating a photo-thermal signal amplitude; monitoring real-time change of the absorption loss of the deep ultraviolet optical element in the deep ultraviolet laser irradiation process by adopting a photo-thermal technology; measuring a fluorescence spectrum of the deep ultraviolet optical element and real-time change of the fluorescence spectrum by adopting a laser induction fluorescent technology; and monitoring the performance stability of the deep ultraviolet optical element by measuring the absorption loss of the deep ultraviolet optical element and the real-time change of the fluorescence spectrum.

Description

technical field [0001] The invention relates to a method and a device for measuring the parameters of an optical element, in particular to a method and a device for testing the performance stability of a deep ultraviolet optical element. Background technique [0002] In the VLSI manufacturing process, excimer laser lithography is one of the most important processes. At present, the main laser light source used in semiconductor integrated circuit lithography equipment is argon fluoride excimer laser, and the output wavelength is 193nm. In lithography equipment, deep ultraviolet optical elements are widely used, including reflective optical elements, transmission optical elements, attenuation optical elements, etc., for shaping, transmission and control of 193nm laser beams. The optical materials used to prepare these deep ultraviolet optical components are mainly ultraviolet-grade fused silica and calcium fluoride substrates and fluoride thin film materials (magnesium fluori...

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Application Information

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IPC IPC(8): G01M11/02
Inventor 李斌成
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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