Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive resin composition, and antireflection film and antireflective hard coating film which are produced using same

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of insufficient scratch resistance and chemical resistance of active energy ray-curable resin, and achieve excellent and easy pollution resistance. Cured, high hardness effect

Inactive Publication Date: 2012-05-23
NIPPON KAYAKU CO LTD
View PDF6 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the actual situation is that active energy ray-curable resins have insufficient scratch resistance and insufficient chemical resistance.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition, and antireflection film and antireflective hard coating film which are produced using same
  • Photosensitive resin composition, and antireflection film and antireflective hard coating film which are produced using same

Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0083] 37.5 parts of a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA), 2.5 parts of tetrahydrofurfuryl acrylate (manufactured by Osaka Organic Chemical Co., Ltd., Biscoat #150), Irgacure 1.5 parts of 184 (manufactured by Ciba Specialty Chemicals), 1 part of Irgacure907 (manufactured by Ciba Specialty Chemicals), CELNAX CX-Z603M-F2 (manufactured by Nissan Chemical Industries, Ltd., zinc antimonate methanol dispersion sol, solid content 60%, average 12.5 parts of particle diameter (15-20 nm), 8 parts of methanol, 7.5 parts of propylene glycol monomethyl ether, 2.5 parts of diacetone alcohol, and 27 parts of methyl ethyl ketone were mixed to obtain a hard coating agent with a solid content of 50%.

[0084] The obtained hard coating agent was coated on a triacetyl cellulose (TAC) film (manufactured by Konica Minolta Opto, Inc.) with a thickness of 80 μm before saponification treatment to make the...

manufacture example 2

[0086] 24 parts of a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA), 3 parts of tetrahydrofurfuryl acrylate (manufactured by Osaka Organic Chemical Co., Ltd., Biscoat #150), Irgacure 184 (manufactured by Ciba Specialty Chemicals) 1.8 parts, Irgacure907 (manufactured by Ciba Specialty Chemicals) 1.2 parts, CELNAX CX-S505M (manufactured by Nissan Chemical Industries, Ltd., methanol dispersion sol of tin oxide, solid content 50%, average particle size 10 ~40nm) 40 parts, 25 parts of 1-propanol, and 5 parts of diacetone alcohol were mixed to obtain a hard coat agent with a solid content of 50%.

[0087]The obtained hard coating agent was coated on a triacetyl cellulose (TAC) film (manufactured by Konica Minolta Opto, Inc.) with a thickness of 80 μm before saponification treatment to make the film thickness about 5 μm, and dried at 80° C. , UV irradiation machine using high-pressure mercury lamps...

Embodiment 1～2、 comparative example 1～2

[0089] The photosensitive resin composition which mixed the material shown in Table 1 was prepared.

[0090] [Table 1] Mixing table (unit indicates "part")

[0091]

[0092] (Note)

[0093] DPHA: manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA (mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate) (component (A))

[0094] ELCOM: Manufactured by Nikki Catalyst Chemicals Co., Ltd., MIBK dispersion of nanoporous silica (solid content: 20%, average particle diameter: 40-60 nm) (component (B))

[0095] TEGO: Degussa company make, TEGO Rad 2600 (number of acrylate functional groups: 6) (component (C))

[0096] X-22: Shin-Etsu Chemical Co., Ltd. product, X-22-2445 (number of acrylate functional groups: 2) (component (C))

[0097] US270: Toagosei Co., Ltd. polysiloxane graft polymer (solid content 30%) (for comparison with (C) component)

[0098] ST103PA: Toray Dow Corning Co., Ltd. polysiloxane (for comparison with component (C))

[0099] Initia...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Hardnessaaaaaaaaaa
Login to View More

Abstract

Provided is a photosensitive resin composition which can be easily cured by means of active energy rays. The photosensitive composition can provide a cured product which exhibits high hardness, and excellent scratch resistance, adhesion, chemical resistance, stain resistance (such as removability of marker pen ink or fingerprints by rubbing), and transparency, and which has a low refractive index. Further, an antireflection film produced using the photosensitive resin composition exhibits a low reflectivity. Also provided are an antireflection film and an antireflective hard coating film, which have films prepared by curing the resin composition. A photosensitive resin composition which comprises (A) a polyfunctional (meth)acrylate having at least three (meth)acryloyl groups in the molecule, (B) colloidal silica that has a nanoporous structure with a mean particle diameter of 1 to 200 nm, and (C) a (meth)acryloyl-containing polysiloxane, and (D) a photo-radical polymerization initiator.

Description

technical field [0001] The present invention relates to a photosensitive resin composition, an antireflection film having a cured film of the composition, and an antireflection hard coat film. More specifically, it relates to a photosensitive resin composition excellent in scratch resistance, abrasion resistance, stain resistance, transparency, low refractive index, and low reflectance when used for an antireflection film and an antireflection hard coat film And anti-reflection film and anti-reflection hard coating film with its cured film. Background technique [0002] Currently, plastics are widely used in various industrial fields such as automobiles, home appliances, and electrical and electronic fields. The reasons why plastics are used in such a large amount are that they are excellent in processability and transparency, light in weight, low in cost, and excellent in optical properties. However, since plastic is softer than glass, etc., it has disadvantages such as b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08F290/06C08J7/04G02B1/10G02B1/11
CPCG02B1/105G02B1/118C08F290/068G02B1/18G02B1/111G03F7/027G03F7/091H01L21/0276Y10S430/1055G02B1/14
Inventor 矢作悦幸狩野浩和
Owner NIPPON KAYAKU CO LTD