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Method for manufacturing X-ray diffraction grating with large height-width ratio

A diffraction grating and X-ray technology, which is applied in the field of manufacturing X-ray diffraction gratings with large aspect ratios, can solve problems such as sticking and photoresist collapse, and achieve a simple manufacturing process, avoiding inaccurate alignment problems, and low cost Effect

Inactive Publication Date: 2012-07-18
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Aiming at the problem that the photoresist with large aspect ratio is prone to collapse and stickiness, the main purpose of the present invention is to provide a method for manufacturing X-ray diffraction grating with large aspect ratio

Method used

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  • Method for manufacturing X-ray diffraction grating with large height-width ratio
  • Method for manufacturing X-ray diffraction grating with large height-width ratio
  • Method for manufacturing X-ray diffraction grating with large height-width ratio

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Embodiment Construction

[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0029] The method for making X-ray diffraction grating with large aspect ratio provided by the present invention does not form a photoresist with a large aspect ratio, divides the photoresist into two layers to reduce the thickness, and evaporates a thin gold layer in the middle to form a support, thereby realizing Components with high line width requirements, specifically include the following steps:

[0030] Step 1: Spin-coat a layer of 1 μm polyimide PI on the front of a clean silicon substrate, and wet-etch the silicon substrate from the back of the silicon substrate until the polyimide PI is formed to form a hollow polyimide. Imide PI film, and then evaporate a layer of 5nmCr / 10nmAu on the polyimide PI film as an ele...

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Abstract

The invention discloses a method for manufacturing an X-ray diffraction grating with large height-width ratio, which includes: manufacturing a mask A, manufacturing a substrate B of X-ray photo-etching and bonding the mask A and the substrate B to form the X-ray diffraction grating with large height-width ratio. Compared with a common grating, the X-ray diffraction grating with large height-width ratio can be manufactured through the method. The method for manufacturing the X-ray diffraction grating with large height-width ratio is simple in manufacturing process, low in cost and capable of being used for large-scale manufacturing of the gratings, avoids complexity of secondary electron beam direct writing and inaccuracy in alignment, and can better manufacture the accurate grating with large height-width ratio.

Description

technical field [0001] The invention belongs to the technical field of nanoscale components, and in particular relates to a method for manufacturing an X-ray diffraction grating with a large aspect ratio. Background technique [0002] As we all know, with the continuous development of the field of nanofabrication, the required components are becoming more and more precise, and the aspect ratio requirements are getting larger and larger. Generally, a diffractive optical element with an aspect ratio of the feature pattern size greater than 4 in the entire device is called a high aspect ratio diffractive optical element. [0003] It is difficult to produce a large aspect ratio X-ray diffraction grating with an aspect ratio greater than 4 using ordinary manufacturing processes. The resist, whose surface tension is greater than the internal stress of the photoresist, is easy to stick together, thus limiting the further development of its process. [0004] Therefore, how to over...

Claims

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Application Information

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IPC IPC(8): G02B5/18G03F7/20G03F7/00
Inventor 谢常青方磊朱效立李冬梅刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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