Nano grating mask preparation method for surface plasma photoetching
A technology of surface plasmon and nano-grating, which is applied in the photoplate-making process of patterned surface, optical mechanical equipment, optics, etc., can solve the problems of difficult preparation of grating, difficult preparation, high price, etc., and achieve the effect of reducing costs
Active Publication Date: 2012-08-08
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Abstract
The invention provides a nano grating mask preparation method for surface plasma photoetching, which comprises the steps that: a grating array structure is prepared on a substrate; shadow evaporation of masking layer, RIE (Reactive Ion Etching) of substrate and removal of masking layer are carried out in the direction of one side of a grating line, and shadow evaporation of masking layer, RIE (Reactive Ion Etching) of substrate and removal of masking layer are carried out in the direction of the other side of the grating line; isotropic etching is carried out using RIE, or the grating line issubjected to isotropic wet etching through etchant, and the depth of RIE or wet etching is controlled to reduce the width of the grating line to a preset value; and shadow evaporation of masking layer, RIE (Reactive Ion Etching) of substrate and removal of masking layer are carried out in the direction of one side of the width-reduced fiber grating, and then shadow evaporation of masking layer, RIE (Reactive Ion Etching) of substrate and removal of masking layer are carried out in the direction of the other side of the width-reduced fiber grating. The lines obtained according to the method disclosed by the invention is four times as much as the lines of the previous grating, and grating period is reduced to one fourth of the previous grating period.
Application Domain
Photomechanical apparatus
Technology Topic
NanometreIsotropic etching +7
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PUM
Property | Measurement | Unit |
Width | 15.0 | nm |
Width | 20.0 | nm |
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