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Synthesis method of styrene/acrylate-modified quick-drying water-based alkyd resin

A water-based alkyd resin, alkyd resin technology, applied in the direction of coating, can solve the problems of low hardness and slow drying rate, and achieve the effect of improving gloss, increasing efficiency and increasing hardness

Inactive Publication Date: 2013-10-16
XINJIANG TECHN INST OF PHYSICS & CHEM CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, water-based alkyd resin still has disadvantages such as low hardness and slow drying rate.

Method used

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  • Synthesis method of styrene/acrylate-modified quick-drying water-based alkyd resin
  • Synthesis method of styrene/acrylate-modified quick-drying water-based alkyd resin
  • Synthesis method of styrene/acrylate-modified quick-drying water-based alkyd resin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] a. Synthesis of basic alkyd resin: Add 144g of linoleic acid, 21.0g of benzoic acid, 42.0g of isophthalic acid, 15.0g of pentaerythritol, 57.0g of trimethylolpropane and 60mL of xylene into a 1000mL three-necked flask in turn, start Stir mechanically, raise the temperature to 180°C, slowly raise the temperature to 230°C within 1 hour, after the acid value drops to 40-50mgKOH / g, cool down to 160°C, add 6.9g maleic anhydride, then raise the temperature to 200°C, and keep warm for esterification to Stop heating after the acid value drops to 18-22mgKOH / g, drop to room temperature, and obtain the basic alkyd resin for subsequent use;

[0024] b. Modification of basic alkyd resin: add 60.0g of styrene, 90.1g of butyl methacrylate, and acrylic acid to the basic alkyd resin obtained in step a within 4-5 hours at a temperature of 130°C. 36.2g and the mixed solution of 3.3g of 50% initiator benzoyl peroxide accounting for 3% of the total amount of modified monomers. Benzoyl 1.6g...

Embodiment 2

[0026] a. Synthesis of basic alkyd resin: Add 144g of linoleic acid, 21.0g of benzoic acid, 42.0g of isophthalic acid, 15.0g of pentaerythritol, 57.0g of trimethylolpropane and 60mL of xylene into a 1000mL three-necked flask in turn, start Stir mechanically, raise the temperature to 180°C, slowly raise the temperature to 230°C within 1 hour, after the acid value drops to 40-50mgKOH / g, cool down to 160°C, add 6.9g maleic anhydride, then raise the temperature to 200°C, and keep warm for esterification to Stop heating after the acid value drops to 18-22mgKOH / g, drop to room temperature, and obtain the basic alkyd resin for subsequent use;

[0027] b. Modification of basic alkyd resin: add 69.8 g of styrene, 132.0 g of butyl methacrylate, and 39.0 g of acrylic acid to the basic alkyd resin obtained in step a within 4-5 hours at a temperature of 130 ° C. g and 50% initiator benzoyl peroxide 3.1g mixed solution accounting for 3% of the total amount of the modified monomer, after bei...

Embodiment 3

[0029] a. Synthesis of basic alkyd resin: add 144g of linoleic acid, 21.0g of benzoic acid, 42.0g of isophthalic acid, 15.0g of pentaerythritol, 57.0g of trimethylolpropane and 60mL of xylene into a 1000mL three-necked flask in turn, start Stir mechanically, heat up to 180°C, slowly heat up to 230°C within 1 hour, after the acid value drops to 40-50mgKOH / g, cool down to 160°C, add 6.9g maleic anhydride, then heat up to 200°C, keep warm for esterification to Stop heating after the acid value drops to 18-22mgKOH / g, drop to room temperature, and obtain the basic alkyd resin for subsequent use;

[0030] b. Modification of the basic alkyd resin: Add the modified monomers to the basic alkyd resin obtained in step a within 4-5 hours at a temperature of 130°C to 64.8g of styrene, 136.5g of butyl methacrylate, and 39.3g of acrylic acid g and 50% initiator benzoyl peroxide 3.6g mixed solution accounting for 3% of the total amount of the modified monomer, after being incubated for 1h, ad...

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Abstract

The invention relates to a synthesis method of a styrene / acrylate-modified quick-drying water-based alkyd resin, which comprises the steps of synthesis of base alkyd resin and modification of the base alkyd resin. The styrene / acrylate-modified quick-drying water-based alkyd resin is synthesized by a fatty acid process and a graft copolymerization process. The method comprises the following steps: polycondensing monoacid, polybasic acid and polyalcohol to obtain a base alkyd resin; and mixing modifying monomers and an initiator, and dropwisely adding the mixture into the base alkyd resin to carry out graft copolymerization, thereby obtaining the modified alkyd resin. The quick-drying water-based alkyd resin obtained by the method provided by the invention has the advantages of quick drying at normal temperature, high hardness, hydrolysis resistance, high water resistance, strong weather resistance and high glossiness.

Description

technical field [0001] The present invention relates to the paint industry in the field of chemistry and chemical engineering, in particular to a base material used in water-based paints, namely a formula synthesis preparation method of a styrene and acrylate modified quick-drying alkyd resin aqueous dispersion and Prepared varnishes. Background technique [0002] Compared with traditional solvent-based coatings, water-based coatings use water as a solvent, which reduces VOC emissions. In addition, the production and construction of water-based coatings are safe, non-toxic, non-flammable, and the equipment is easy to clean. It is a development trend in the coatings industry under the background of environmental protection and renewable resources replacing petroleum products. [0003] As a kind of coating resin, alkyd resin is the earliest synthetic resin with the largest output. It has the advantages of low price, many varieties, large formula changes, mature technology, ab...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F283/01C08G63/91C08G63/49C09D151/08
Inventor 谢永新陈朝阳孙潇潇陈剑棘闫世友
Owner XINJIANG TECHN INST OF PHYSICS & CHEM CHINESE ACAD OF SCI
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