Preparation method of near ultraviolet-excited high silica blue-light-emitting glass

A high-silicon, near-ultraviolet technology, applied in the field of high-silicon blue luminescent glass, can solve the problem of limited doping concentration of porous glass

Active Publication Date: 2012-10-03
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the suitable doping concentration of this po

Method used

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  • Preparation method of near ultraviolet-excited high silica blue-light-emitting glass

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Experimental program
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Effect test

Embodiment 1

[0026] Take analytically pure chemical reagents, according to SiO 2 38.78wt%, Na 2 CO 3 9.79wt%, H 3 BO 3 42.42wt%, Al(OH) 3 3.73wt%, CaCO 3 5.01wt%, CuCl 2 The ratio of 0.27wt% is used to prepare mixed raw materials. After mixing and grinding evenly, put it into a platinum crucible, and after melting at a high temperature of 1450°C for 40 minutes, cool it on an iron plate at 400°C to form borosilicate glass.

[0027]Put the borosilicate glass into a high-temperature furnace and heat-treat at 670° C. for 20 hours, and then cut it into glass pieces of 5 mm×5 mm×1 mm. Put the glass sheet into a sealed autoclave, and place it at 98°C for five times of acid treatment for 24 hours each time; the first time immerse it in 1mol / L nitric acid solution at the ratio of 50ml acid solution / gram of glass, and the second time Immerse in 1mol / L nitric acid solution at the ratio of 10ml acid solution / gram glass for the second time, immerse in 0.3mol / L nitric acid solution at the ...

Embodiment 2

[0032] Take analytically pure chemical reagents, according to SiO 2 30.91wt%, Na 2 CO 3 7.80wt%, H 3 BO 3 54.10wt%, Al(OH) 3 2.97wt%, CaCO 3 4.00wt%, Cr 2 o 3 The ratio of 0.22wt% is used to prepare mixed raw materials. After mixing and grinding evenly, put it into a corundum crucible, and after melting at 1400°C for 45 minutes, cool it on an iron plate at 100°C to form borosilicate glass.

[0033] Put the borosilicate glass into a high-temperature furnace and heat-treat at 650° C. for 10 hours, and then cut it into glass pieces of 5 mm×5 mm×1 mm. Put the glass into a sealed autoclave and place it at 90°C for five times of acid treatment for 12 hours each time; the first time immerse it in 1mol / L hydrochloric acid solution at a ratio of 50ml per g of glass, and the second to Immerse in 1mol / L hydrochloric acid solution at a ratio of 10ml per g glass for five times. Before changing the acid solution, place the glass at 200°C for 5 hours to promote the precipitat...

Embodiment 3

[0036] Take analytically pure chemical reagents, according to SiO 2 20.47wt%, Na 2 CO 3 3.27wt%, H 3 BO 3 46.05wt%, Al(OH) 3 2.92wt%, the ratio of waste bottle glass 27.29wt% is used to prepare mixed raw materials. After mixing and grinding evenly, put it into a platinum crucible, and after melting at 1500°C for 30 minutes, cool it on an iron plate at 300°C to form borosilicate glass.

[0037] Put the borosilicate glass into a high-temperature furnace and heat-treat at 590° C. for 80 hours, and then cut it into glass pieces of 5 mm×5 mm×1 mm. Put the glass in a sealed autoclave and place it at 100°C for four times of acid treatment for 48 hours each time; the first time immerse it in 1mol / L nitric acid solution at the ratio of 50ml acid solution / gram of glass, and the second time Immerse in 1mol / L nitric acid solution at the ratio of 10ml acid solution / gram glass for the first time, and immerse in 0.3mol / L nitric acid solution at the ratio of 10ml acid solution / gram ...

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Abstract

The invention discloses a preparation method of near ultraviolet-excited high silica blue-light-emitting glass. The preparation method comprises the steps of: firstly melting borosilicate glass, carrying out acid leaching to obtain large-aperture and intact porous glass after carrying out thermal treatment on split-phase at a higher temperature; dipping the porous glass into solution containing europium ion to soak and dope, and sintering at the high temperature in a reducing atmosphere to obtain the compact high silica blue-light-emitting glass. The glass disclosed by the invention greatly improves the doping concentration of the europium ion under the precondition of keeping the luminous intensity of the near ultraviolet-excited high silica blue light emitting, and facilitates laser excitation. The optimal excitation wavelength of the glass disclosed by the invention is expanded to a range of 350-390nm, so a high-pressure mercury lamp which is relatively safe to a human body and mature in the development and an LED (light-emitting diode) can be utilized as excitation light sources by the improvement, and the safety and convenience in application are improved. Therefore, the preparation method can be applied to the industries such as illumination and decoration and life purposes, and is expected to be a new laser material.

Description

technical field [0001] The invention relates to a high-silica blue-emitting glass, in particular to a preparation method of a near-ultraviolet-excited high-silica blue-emitting glass. Background technique [0002] After borosilicate glass is annealed at a certain temperature, it can transform from a homogeneous system to a phase-separated system including a boron-rich phase and a silicon-rich phase. Uniform dispersion between the two phases. Through acid leaching and water leaching at a certain temperature and pressure, the boron-rich phase can be dissolved to produce a high-silica system with a uniform porous structure. The porous glass is impregnated and doped in solutions containing different rare earth and transition metal ions, and then sintered at high temperature with controlled atmosphere to prepare dense high-silica luminescent glass. If dipped in a solution containing europium ions and sintered in a reducing atmosphere, the contained europium ions can be transfor...

Claims

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Application Information

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IPC IPC(8): C03C4/12C03C6/02
Inventor 沈应龙陈丹平刘双盛秋春
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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