Method for manufacturing quantum dot field effect transistor array
A technology of field-effect transistors and quantum dots, which is applied in the field of weak light detection, can solve the problems that ordinary CCDs cannot effectively detect weak light, and achieve the effects of low power consumption, low working voltage and high detection efficiency
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[0034] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0035] like figure 1 as shown, figure 1 It is a flowchart of a method for preparing a quantum dot field effect transistor array according to an embodiment of the present invention, and the method includes the following steps:
[0036] Step 1: Select the epitaxial wafer, apply photoresist on the epitaxial wafer, etch the epitaxial wafer to form a source-drain channel, and the sources of the same row are connected together during photolithography;
[0037] Step 2: Evaporate electrodes on the source and drain electrodes, and perform electrode annealing to form ohmic contacts between the source and drain electrodes and the conductive channel;
[0038] Step 3: Evaporate transparent electrodes, and photo-etch grid strips betw...
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