A ceramic aluminum-clad substrate and its preparation method
A ceramic substrate and aluminum-coated technology, which is applied in the field of ceramic metallization, can solve the problems of secondary processing, cost consumption, process control, and high equipment requirements, and achieve the effect of cost saving
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[0020] The present invention also provides a method for preparing a ceramic aluminum-clad substrate, comprising the following steps:
[0021] Step 1, pretreatment: pretreatment is performed on the ceramic substrate.
[0022] The ceramic substrate used in the present invention can be a ceramic substrate commonly used in the art, preferably an aluminum nitride ceramic substrate, an alumina ceramic substrate, which can be obtained commercially, for example: Fujian Huaqing Electronic Material Technology Co., Ltd. AlN ceramic substrates. The thickness of the ceramic substrate is not particularly limited, and it is generally available on the market, but in order to save costs, preferably, the thickness of the ceramic substrate is 0.1-1mm, more preferably 0.38-0.63mm .
[0023] The pretreatment includes cleaning the ceramic substrate, and then roughening or sandblasting. The cleaning includes sequentially degreasing, water washing, pickling, and water washing and then drying the c...
Embodiment 1
[0044] 1. Pretreatment: Take a 0.6mm thick alumina ceramic substrate, use JPL-209 universal degreasing agent produced by Shenzhen Jabil Electronic Technology Co., Ltd. to degrease the alumina ceramic substrate for 2 minutes, then wash it with water, and then use H 2 SO 4 Solution (H 2 SO 4 The content is 5wt%) pickling for 3 minutes, washing with water, drying, and then sandblasting;
[0045] 2. Aluminum-coated film: After sandblasting, a layer of aluminum film with a thickness of 1 μm is coated on one surface of the ceramic substrate by vacuum magnetron sputtering. ﹣3 It is carried out under the vacuum degree of Pa, the target material is aluminum target material, the sputtering time is 5min, the voltage is 370V, and the current is 12A;
[0046] 3. Applying aluminum foil: Lay 0.08mm thick 4047 aluminum silicon solder sheet and 0.4mm thick aluminum foil on the aluminum film in sequence, and apply an iron block on the aluminum foil so that the uniform pressure on the surface...
Embodiment 2
[0048] 1. Pretreatment: Take a 0.5mm thick alumina ceramic substrate, use JPL-209 universal degreasing agent produced by Shenzhen Jabil Electronic Technology Co., Ltd. to degrease the alumina ceramic substrate for 3 minutes, wash it with water, and then use H 2 SO 4 Solution (H 2 SO 4 The content is 6wt%) after pickling for 4 minutes, water washing, drying, and then sandblasting;
[0049] 2. Aluminum-coated film: After sandblasting, a layer of aluminum film with a thickness of 2 μm is coated on one surface of the ceramic substrate by vacuum magnetron sputtering. ﹣3 It is carried out under the vacuum degree of Pa, the target material is aluminum target material, the sputtering time is 10min, the voltage is 400V, and the current is 12A;
[0050] 3. Applying aluminum foil: Lay 0.1mm thick 4047 Al-Si solder sheet and 0.5mm thick aluminum foil on the aluminum film in sequence, and apply an iron block on the aluminum foil so that the uniform pressure on the surface of the aluminu...
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