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Composition for removing metal ions in ultra-pure ammonia and use method of same

A technology for metal ions and compositions is applied in the field of compositions for removing metal ions in the production of ultrapure liquid ammonia, which can solve the problems affecting the purity of ultrapure ammonia production, liquid ammonia pollution, etc., and achieve high metal ion removal rate and production cycle. short, simple effects

Active Publication Date: 2012-12-05
SUZHOU JINHONG GAS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of oxidized carbon nanotubes will be discharged into the liquid ammonia produced as raw material, which will pollute the liquid ammonia and affect the purity of ultra-pure ammonia production.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] 1. Preparation of carbon nanotubes by pyrolysis polymer method.

[0018] 2. Oxidize the carbon nanotubes with 30% nitric acid.

[0019] 3. Weigh 2% dispersant sodium tripolyphosphate, 40% diluent cyclohexanone, and 58% adhesive material epoxy resin in mass percentage, mix and stir evenly to form an adhesive.

[0020] 4. Weighing 30% by mass of adhesive and 70% by mass of carbon nanotubes, mixing them and stirring evenly to form a slurry.

[0021] 5. Apply the slurry on the liquid ammonia delivery system by dipping a brush in the slurry coating method.

[0022] 6. Then dry at 160°C and polish with sandpaper.

[0023] 7. Clean the pipeline system to remove various impurities.

[0024]

Embodiment 2

[0026] 1. Preparation of carbon nanotubes by chemical vapor deposition.

[0027] 2. Oxidize the carbon nanotubes with 20% sulfuric acid.

[0028] 3. Weigh 1% dispersant sodium hexametaphosphate, 50% diluent xylene, and 49% adhesive material phenolic resin in mass percentage, mix and stir evenly to form an adhesive.

[0029] 4. Weighing 20% ​​by mass of adhesive and 80% by mass of carbon nanotubes, mixing them and stirring evenly to form a slurry.

[0030] 5. Apply the slurry on the liquid ammonia delivery system by dipping a brush in the slurry coating method.

[0031] 6. Then dry at 150°C and polish with sandpaper.

[0032] 7. Clean the pipeline system to remove various impurities.

[0033]

Embodiment 3

[0035] 1. Preparation of carbon nanotubes by arc discharge method.

[0036] 2. Oxidize the carbon nanotubes with 50% sodium hypochlorite.

[0037] 3. Weigh 3% dispersant sodium pyrophosphate, 60% diluent n-butanol, and 37% adhesive material polyurethane, mix and stir evenly to form an adhesive.

[0038] 4. Weighing 10% of the binder with a mass percentage and 90% of the carbon nanotubes with a mass percentage, and stirring evenly after mixing to form a slurry.

[0039] 5. Apply the slurry on the liquid ammonia delivery system by dipping a brush in the slurry coating method.

[0040] 6. Then dry at 120°C and polish with sandpaper.

[0041] 7. Clean the pipeline system to remove various impurities.

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Abstract

The invention discloses a composition for removing metal ions in ultra-pure ammonia and a use method of same. The composition comprises 70-90% of carbon nano tube part A and 10-30% of adhesive part B in percentage by mass, wherein the adhesive is required to be low temperature resistant and corrosion resistant. The composition disclosed by the invention can be coated in a liquid ammonia pipeline system to form an adsorbing coating. The composition disclosed by the invention and the liquid ammonia pipeline system formed by the same have the advantages of lower cost, simple process and short production period; and an obtained metal ion removed layer obtains higher metal ion removing rate and better bonding force.

Description

technical field [0001] The invention relates to a composition for removing impurities in gas production and a method for using the composition, in particular to a composition for removing metal ions in the production of ultrapure liquid ammonia and a method for using the composition. Background technique [0002] Ultra-high purity ammonia is a key material in the production of optoelectronic devices. Widely used in semiconductor light-emitting devices LED, solar photovoltaic cells PV, semiconductor integrated circuits IC and liquid crystal display LCD and other industries. In recent years, my country's LED and solar cell technology and related industries have developed rapidly. In the process of manufacturing LED grains and solar cells, a large amount of ultra-high-purity ammonia is used as a nitrogen source. Especially when LED epitaxial wafers are growing, the purity of ammonia required is very high, and the requirements for the metal ions in it are also high. If the con...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/20B01J20/26B01J20/30C01C1/02
Inventor 金向华孙猛李荷庆
Owner SUZHOU JINHONG GAS CO LTD
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