Preparation method for growing zinc oxide nano wire arrays
A technology of zinc oxide nanowires and zinc oxide seed layers is applied in the field of preparation of zinc oxide nanowire arrays, which can solve the problems of small nanowire arrays and difficulty in obtaining diameter of ZnO nanowires, and achieve large specific surface area, low cost, and synthetic simple craftsmanship
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0023] Preparation of ZnO seed layer:
[0024] Raise the temperature of the inner cavity of the atomic layer deposition system to 150℃, open the cavity, and put the substrate into the cavity; the pressure in the cavity drops below 25 hPa, clean the reaction cavity with inert gas; pass the zinc precursor into the reaction cavity, The pulse time is 0.1 s, and then the inert gas is used to clean the unreacted precursor. The pulse time is 5 s, and then the oxygen precursor is passed in. The pulse time is 0.1 s; then the inert gas is used to clean the unreacted oxygen precursor to complete one The cycle of depositing zinc oxide; repeat this, depositing 100 cycles of ZnO layer on the surface of the substrate; annealing in a muffle furnace at 400°C for 2 hours.
[0025] Growth of ZnO nanowire array:
[0026] Weigh 2 g of NaOH powder into a three-necked bottle, take 1 ml of triethanolamine in the three-necked bottle, add 25 ml of deionized water to the three-necked bottle, weigh 7 g of zinc...
Embodiment 2
[0029] Preparation of ZnO seed layer:
[0030] Raise the temperature of the inner cavity of the atomic layer deposition system to 150℃, open the cavity, and put the substrate into the cavity; the pressure in the cavity drops below 25 hPa, clean the reaction cavity with inert gas; pass the zinc precursor into the reaction cavity, The pulse time is 0.5 s, and then the inert gas is used to clean the unreacted precursor. The pulse time is 5 s, and then the oxygen precursor is passed in. The pulse time is 0.5 s; then the inert gas is used to clean the unreacted oxygen precursor to complete one The cycle of depositing zinc oxide; repeating this way, depositing 200 cycles of ZnO layer on the surface of the substrate; annealing in a muffle furnace at 400°C for 3 hours.
[0031] Growth of ZnO nanowire array:
[0032] Weigh 4 g of NaOH powder into a three-necked bottle, take 3 ml of triethanolamine in a three-necked bottle, add 50 ml of deionized water to the three-necked bottle, weigh out 10...
Embodiment 3
[0034] Preparation of ZnO seed layer:
[0035] Raise the temperature of the inner cavity of the atomic layer deposition system to 200℃, open the cavity, and put the substrate into the cavity; the pressure in the cavity drops below 25 hPa, clean the reaction cavity with inert gas; pass the zinc precursor into the reaction cavity, The pulse time is 1 s, and then the inert gas is used to clean the unreacted precursor. The pulse time is 5 s, and then the oxygen precursor is passed in. The pulse time is 1 s; then the inert gas is used to clean the unreacted oxygen precursor to complete one The cycle of depositing zinc oxide; repeating this way, depositing 100 cycles of ZnO layer on the surface of the substrate; annealing in a muffle furnace at 500°C for 2 hours.
[0036] Growth of ZnO nanowire array:
[0037] Weigh 2 g of NaOH powder into a three-necked bottle, take 1 ml of diethanolamine in the three-necked bottle, add 25 ml of deionized water to the three-necked bottle, weigh 5 g of zi...
PUM
| Property | Measurement | Unit |
|---|---|---|
| diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 