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Preparation method of glass loaded copper/chromium ion double doped nano titanium dioxide photocatalysis film

A nano-titanium dioxide and photocatalytic film technology, applied in the field of photocatalytic materials, can solve the problems of decreased photocatalytic activity, decreased adsorption performance, low photocatalytic activity, etc., and achieves improved degradation rate, strong adhesion, and high photocatalytic performance. Effect

Inactive Publication Date: 2013-04-03
HUBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, once TiO2 is immobilized, its adsorption performance decreases significantly, resulting in low photocatalytic activity; in addition, during the heat treatment process of loading TiO2 on glass, sodium ions in the glass migrate to the TiO2 film, which significantly reduces the photocatalytic activity.

Method used

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  • Preparation method of glass loaded copper/chromium ion double doped nano titanium dioxide photocatalysis film
  • Preparation method of glass loaded copper/chromium ion double doped nano titanium dioxide photocatalysis film

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Experimental program
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Embodiment 1

[0025] The glass substrate was first cleaned with tap water, then ultrasonically cleaned with distilled water and absolute ethanol for 5 minutes, and dried in an oven for later use. Dissolve 10g of ethyl silicate (10.7mL, 0.048mol) in 30mL of absolute ethanol (0.51mol), stir well; then add 5mL of 12.2mol / L hydrochloric acid (0.061mol) and 1mL of distilled water (0.056mol), and continue stirring 20 minutes to get stable SiO 2 Sol. Dip the clean glass substrate into the prepared SiO 2 In the sol, the substrate was pulled vertically upward at a pulling speed of 5 cm / min, and then dried at 60°C. Put the dried sample into a muffle furnace and bake it at 500°C for 1 hour to prepare SiO-coated 2 Thin films on glass substrates.

[0026] Stir and mix 8.2mL butyl titanate (also known as tetra-n-butyl titanate), 56.2mL absolute ethanol and 7.0mL glacial acetic acid to form solution A; Cu :M Ti =1.0% and M Cr :M Ti =2.0% Calculate and weigh the required copper nitrate trihydrate a...

Embodiment 2

[0029] The glass substrate was first cleaned with tap water, then ultrasonically cleaned with distilled water and absolute ethanol for 5 minutes, and dried in an oven for later use. Dissolve 10g of ethyl silicate (10.7mL, 0.048mol) in 30mL of absolute ethanol (0.51mol), stir well; then add 5mL of 12.2mol / L hydrochloric acid (0.061mol) and 1mL of distilled water (0.056mol), and continue stirring 20 minutes to get stable SiO 2 Sol. Dip the clean glass substrate into the prepared SiO 2 In the sol, the substrate was pulled vertically upward at a pulling speed of 5 cm / min, and then dried at 60°C. Put the dried sample into a muffle furnace and bake it at 500°C for 1 hour to prepare SiO-coated 2 Thin films on glass substrates.

[0030] Stir and mix 8.2mL butyl titanate, 56.2mL absolute ethanol and 7.0mL glacial acetic acid to form solution A; Cu :M Ti =1.0% and MCr :M Ti =2.0% Calculate and weigh the required copper nitrate trihydrate and chromium nitrate nonahydrate respectiv...

Embodiment 3

[0034] The glass substrate was first cleaned with tap water, then ultrasonically cleaned with distilled water and absolute ethanol for 5 minutes, and dried in an oven for later use. Dissolve 10g of ethyl silicate (10.7mL, 0.048mol) in 30mL of absolute ethanol (0.51mol), stir well; then add 5mL of 12.2mol / L hydrochloric acid (0.061mol) and 1mL of distilled water (0.056mol), and continue stirring 20 minutes to get stable SiO 2 Sol. Dip the clean glass substrate into the prepared SiO 2 In the sol, the substrate was pulled vertically upward at a pulling speed of 5 cm / min, and then dried at 60°C. Put the dried sample into a muffle furnace and bake it at 500°C for 1 hour to prepare SiO-coated 2 Thin films on glass substrates.

[0035] Stir and mix 8.2mL butyl titanate, 56.2mL absolute ethanol and 7.0mL glacial acetic acid to form solution A; Cu :M Ti =1.0% and M Cr :M Ti =2.0% Calculate and weigh the required copper nitrate trihydrate and chromium nitrate nonahydrate respect...

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Abstract

The invention discloses a preparation method of a glass loaded copper / chromium ion double doped nano titanium dioxide photocatalysis film. The preparation method comprises the following steps: firstly, plating an SiO2 film on a glass substrate by using a sol-gel method; further dipping the glass substrate plated with the SiO2 film into copper / chromium ion double doped titanium dioxide sol; and lifting, drying and roasting so as to prepare the film. Compared with a pure nano titanium dioxide photocatalysis film, the glass loaded copper / chromium ion double doped nano titanium dioxide photocatalysis film has the advantages that the SiO2 film plated on the glass substrate increases the degradation rate of methylene blue dye by two fold.

Description

technical field [0001] The invention belongs to the technical field of photocatalytic materials, and in particular relates to a method for preparing a glass-loaded copper / chromium ion double-doped nano-titanium dioxide photocatalytic film. Background technique [0002] In recent years, the use of semiconductor materials to photocatalyze the degradation of toxic and harmful pollutants has become one of the more popular research topics. This technology can use natural light sources to drive chemical reactions. It not only has low energy consumption, simple operation, mild reaction conditions, and no secondary pollution, but also can effectively convert organic pollutants into small inorganic molecules to achieve deep mineralization. Semiconductor photocatalysis technology represented by titanium dioxide has broad application prospects in the field of environmental governance. It has the functions of wastewater treatment, air purification, antibacterial, deodorization and self...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/86B01J35/06C02F1/30
Inventor 周国华刘刚胡夏云张婉丽
Owner HUBEI UNIV OF TECH
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