Preparation method of hollow microsphere silicon dioxide (SiO2) antireflection film

An anti-reflection film and hollow microsphere technology, applied in solid-state chemical plating, metal material coating process, coating and other directions, can solve the problems such as the inability to significantly improve the light transmittance of solar cells, the thin film is easy to fall off, and the adsorption is poor. , to achieve the effect of improving photoelectric conversion efficiency, low cost, and enhanced absorption capacity

Inactive Publication Date: 2013-05-01
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD +1
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Problems solved by technology

Preparation of SiO by template method 2 Anti-reflection film, there are problems such as the choice of template particle size; the traditional method uses the SiO prepared by the sol-gel method 2 Anti-reflection coating, SiO prepared by alkaline sol 2 Anti-reflection film, there are problems such as loose film, easy to fall off, and poor adsorption; acid sol prepares SiO 2 Anti-reflection film, there are dense film particles, which cannot significantly improve the light transmittance of solar cells

Method used

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Embodiment

[0020] First, dissolve TEOS (tetraethyl tetrasilicate) in ethanol to make 240ml of alcohol solution with a concentration of 0.416mol / L, and add 30mL of it dropwise under stirring at a speed of 300r / min polyacrylic acid, followed by dropwise addition of 25 mL of oxalic acid aqueous solution with a concentration of 3.12 mol / L, TEOS and H 2 Hydrolysis and condensation reaction occurs in O, but the reaction rate is very slow. In this embodiment, oxalic acid is added to increase the rate of hydrolysis reaction. Then the reaction system was stirred and homogenized for 4 hours to form a sol, which was left to age for 8-10 days.

[0021] The glass substrate is washed with water to remove surface stains, then ultrasonically washed with alcohol, then ultrasonically pickled, then soaked in alcohol and dried with alcohol to make the substrate clean. Subsequently, a film was coated on a glass substrate by a spin coating method, and the coated glass substrate was dried at 70°C. Finally, p...

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Abstract

The invention relates to a preparation method of a hollow microsphere silicon dioxide (SiO2) antireflection film, and the method comprises the following steps of preparing the SiO2 sol with concentration of 0.02mol / L to 0.8mol / L, placing nucleating agent into the SiO2 sol under a stirring condition, then adding stabilizer, and stirring and homogenizing the mixture to form the sol. The nucleating agent is polyelectrolyte with number-average molecular weight of the nucleating agent of 2000 to 5000, mutually soluble with water and easy to decompose under the temperature of less than 300 DEG C, and the stabilizer is N, N - dimethyl formamide and N, N - dimethylacetamide. The sol is used for coating a film on a clean glass substrate, after the coated film is dried at the temperature of 70 to 150 DEG C, the coated film is heated to 300 to 500 DEG C to be thermally treated, the heat preserving time is not less than 0.1h, and the SiO2 antireflection film can be obtained. The prepared SiO2 film can reduce the reflection rate of the sunlight, so that the transmission rate of the sunlight can be improved, the photovoltaic conversion efficiency of a solar battery can be effectively increased, and the method is simple, low in cost and remarkable in economic benefit.

Description

technical field [0001] The present invention relates to a kind of SiO 2 The invention relates to preparing an anti-reflection film which can be used for solar cell glass by using a chain high molecular polymer as a raw material, and belongs to the field of solar cell photovoltaics. Background technique [0002] Relevant studies have shown that the world's energy reserves such as coal resources and oil resources can only be used by humans for 50 to 70 years. Therefore, human beings focus more and more attention on the theoretically inexhaustible solar energy, making it one of the hot topics of research in recent decades. However, how to narrow the gap between the actual photoelectric conversion efficiency and the theoretical photoelectric conversion efficiency and further improve the photoelectric conversion efficiency of solar cells is still a difficult problem in front of mankind. [0003] An anti-reflection film is coated on the glass substrate of the solar cell in order...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C20/08
Inventor 彭寿王芸王萍萍金良茂孙人杰甘治平
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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