Solar selective absorbing film series suitable for medium-high temperature heat usage and preparation method thereof
A solar energy and selective technology, applied in the field of photothermal conversion materials and heat absorbing films for solar collectors, can solve the problem of high emissivity of absorbing films, and achieve the effect of reducing heat loss, high thermal stability and maintaining stability.
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Embodiment 1
[0046] A solar selective absorption film system 1 suitable for medium and high temperature heat utilization and a preparation method thereof.
[0047] The structure of this absorption film system 1 is as attached figure 1 As shown, the thickness composition of each film layer is as follows:
[0048] Copper foil substrate / silver thin film (100nm) / copper thin film (20nm) / TiAl x N y o z Thin film (88nm) / ZnSnSbO x Thin film (60nm) / SiO 2 Thin film (86nm).
[0049] The reflectance spectrum of the film is attached to figure 2 As shown, according to the national standard GB / T6424-2007 and GB / T 4271-2007, the technical indicators of the film system are as follows:
[0050] The absorption rate reaches 96.4%, and the emission rate is 1.9%.
[0051] Taking the process parameters of the magnetron sputtering equipment used in this embodiment as an example, the preparation method of this absorbing film system is as follows:
[0052] First, a silver film was plated on a copper foil ...
Embodiment 2
[0057] A solar selective absorption film system 2 suitable for medium and high temperature heat utilization and a preparation method thereof.
[0058] The structure of this absorbing film system 2 is as attached figure 1 As shown, the thickness composition of each film layer is as follows:
[0059] Al foil substrate / silver thin film (150nm) / copper thin film (10nm) / TiAl x N y o z Thin film (40nm) / ZnSnSbO x Thin film (150nm) / SiO 2 Thin film (50nm).
[0060] The reflection spectrum of the film system is attached image 3 As shown, according to the national standard GB / T6424-2007 and GB / T 4271-2007, the technical indicators of the film system are: the absorption rate reaches 96.2%, and the emissivity rate is 1.8%.
[0061] Taking the process parameters of the magnetron sputtering equipment used in this embodiment as an example, the preparation method of this absorbing film system is as follows:
[0062] First, a silver film was plated on a copper foil substrate with a silv...
Embodiment 3
[0067] A solar selective absorption film system 3 suitable for medium and high temperature heat utilization and a preparation method thereof.
[0068] The structure of this absorption film system 3 is as attached figure 1 As shown, the thickness composition of each film layer is as follows:
[0069] Stainless steel foil substrate / silver thin film (200nm) / copper thin film (5nm) / TiAl x N y o z Thin film (150nm) / ZnSnSbO x Thin film (40nm) / SiO 2 Thin film (150nm).
[0070] The reflection spectrum of the film system is attached Figure 4 As shown, according to the national standard GB / T6424-2007 and GB / T 4271-2007, the technical indicators of the film system are: the absorption rate reaches 97.2%, and the emissivity is 2.0%.
[0071] The preparation method of this coated glass is as follows:
[0072] First, a silver film was plated on a copper foil substrate with a silver target, with a thickness of 200nm, the sputtering power was 1kW, and the argon flow rate was 50 sccm; t...
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Abstract
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