Titanium diboride-nickel thin film with coating structure and preparation method thereof

A titanium diboride and coating structure technology, applied in the coating structure TiB2-Ni film and its preparation, in the field of TiB2-Ni film, can solve the problems of limited improvement of material strength and hardness, achieve short preparation cycle, The effect of expanding the scope of application and convenient operation

Active Publication Date: 2013-06-19
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, TiB in the material 2 Just as a small amount of reinforcing phase (usually TiB 2 ≤20at.%) are distributed inside the metal matrix, which is extremely limited in improving the strength and hardness of the material
[0003] In order to further improve the hardness and strength of metal materials, the present invention proposes a new design idea, which greatly improves the reinforcement phase TiB in the material. 2 The content is a kind of rich TiB 2 Phase film material, and in order to better maintain the toughness of the original metal Ni, the present invention constructs a coating structure, which is a three-dimensional coating of TiB with a nano-Ni layer 2 Cellular microstructure of particles, TiB with this coating structure 2 -Ni film has not been reported yet

Method used

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  • Titanium diboride-nickel thin film with coating structure and preparation method thereof
  • Titanium diboride-nickel thin film with coating structure and preparation method thereof
  • Titanium diboride-nickel thin film with coating structure and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0026] 1) Choose commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; a (100)-oriented single crystal silicon substrate is selected as a substrate.

[0027] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 15 minutes in sequence, and then dried at 80° C. for 2 hours by blasting, and then set aside.

[0028] 3) Using the dual-target magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, as the deposition chamber After the air pressure in the sample chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle...

Embodiment 2

[0034] 1) Choose commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; the substrate is a high-speed steel substrate.

[0035] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 20 minutes in sequence, and then dried at 80°C for 2 hours by air blowing, and then set aside.

[0036] 3) Using the dual-target magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, as the deposition chamber After the air pressure in the sample chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle valve, start the molecular pu...

Embodiment 3

[0042] 1) Choose commercially available TiB with a purity of 99.9% 2 A ceramic target and a commercially available metal Ni target with a purity of 99.99% are used as raw materials; a titanium alloy substrate is selected as a substrate.

[0043] 2) Firstly, the substrate is cleaned, and the substrate is ultrasonically cleaned with absolute ethanol, acetone, and absolute ethanol for 10 minutes respectively, and then air-dried at 80° C. for 2 hours, and set aside.

[0044] 3) Using the dual-target magnetron sputtering system independently designed and produced by our research group, first open the cavity and install the substrate and target correctly, first check that the gas, electricity, and water circuits are normal, then turn on the main power supply and start the mechanical pump, as the deposition chamber After the air pressure in the sample chamber is below 10Pa, close the valve between the mechanical pump and the chamber, open the baffle valve, start the molecular pump, a...

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Abstract

The invention relates to a titanium diboride-nickel thin film with coating structure. The TiB2-Ni thin film is characterized by being prepared from a continuous phase metal Ni and a dispersed phase TiB2 grains through in-situ synthesis. In the TiB2-Ni thin film, metal Ni in a three-dimensional continuous cellular structure uniformly form a basic framework of the thin film, and the TiB2 grains in granular shape uniformly fill in the cellular structure, so as to form a coating microstructure with metal Ni evenly coated with TiB2 grains; and the TiB2 accounts for 60- 95at.%, and Ni accounts for 5-40at.%. The TiB2-Ni thin film with coating structure provided by the invention shows good toughness and high hardness, so as to greatly expand the scope of application of the thin film. A double-target co-sputtering magnetron sputtering technology is easy to operate; composition, structure and performance of the TiB2-Ni thin film material can be well controlled through control of process conditions; and the method does not require a post-treatment process, has short preparation period, low cost and good reproducibility, and is easy to realize industrialized production.

Description

technical field [0001] The invention belongs to the field of new materials and relates to a TiB 2 -Ni film, specifically a cladding structure of TiB 2 -Ni thin film and its preparation method. Background technique [0002] TiB 2 It has the advantages of high hardness, high melting point, low density, high Young's modulus, good thermal conductivity, electrical conductivity, wear resistance and chemical stability, etc. It is an advanced ceramic material with excellent structural and functional properties. Based on TiB 2 High hardness of the material, TiB 2 Particle-reinforced metal matrix composites have been extensively studied. For example: titanium diboride dispersion strengthened copper matrix composite (Chinese invention patent, 200910095176.9), TiB 2 Particle-reinforced magnesium-based composite materials (Chinese invention patent, 200710047943.X), etc. These materials have maintained the excellent properties of the metal matrix such as toughness, electrical conduc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 黄峰王博葛芳芳王怀勇
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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