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Textured structure of crystalline silicon solar cell and preparation method thereof

A technology of solar cells and crystalline silicon, applied in the field of solar energy, can solve the problems of low conversion efficiency of solar cells, unfavorable back surface passivation, deep depth, etc., and achieves a simple and easy preparation method, improved conversion efficiency and good compatibility. Effect

Active Publication Date: 2013-07-24
SUZHOU UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the nano-micro composite suede surface obtained by the above-mentioned preparation method, its nanostructure is in the shape of nanopores, that is, its pore diameter is smaller and the depth is deeper.
Literature reports and experiments have proved that although the surface reflectance of this composite suede structure is reduced to below 12%, it is not conducive to the surface passivation of the subsequent process, and the conversion efficiency of the battery sheet made by it is lower than that of the production line. conventional textured cell

Method used

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  • Textured structure of crystalline silicon solar cell and preparation method thereof
  • Textured structure of crystalline silicon solar cell and preparation method thereof
  • Textured structure of crystalline silicon solar cell and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0052] A method for preparing a textured structure of a polycrystalline silicon solar cell, comprising the steps of:

[0053] (1) Remove and clean the damaged layer of the P-type polysilicon wafer with a thickness of 180±10μm and a size of 156mm×156mm, and then corrode the texture to form a micron-scale texture; then put it into AgNO with a concentration of 0.008mol / L 3 In the solution, react at 20°C for 60 s;

[0054] (2) Put the silicon wafer after the previous step into HF and H 2 o 2 In the mixed solution, the concentrations were 3mol / L and 0.1mol / L respectively, and reacted at 20°C for 300 s;

[0055] (3) Put the silicon wafer after the previous step into a nitric acid solution with a mass percentage of 69% for 300 s, and the cleaning temperature is 20°C;

[0056] (4) Put the silicon wafer after the previous step into a 5% hydrofluoric solution for 200 s by mass, and the cleaning temperature is 20°C;

[0057] (5) Put the silicon wafer after the previous step into 0.05...

Embodiment 2

[0066] A method for preparing a textured structure of a polycrystalline silicon solar cell, comprising the steps of:

[0067] (1) Remove and clean the damaged layer of the P-type polysilicon wafer with a thickness of 180±10μm and a size of 156mm×156mm, and then corrode and make texture to form a micron-scale texture;

[0068] Then put into AgNO with a concentration of 0.008mol / L 3 In the solution, react at 20°C for 60s;

[0069] (2) Put the silicon wafer after the previous step into HF and H 2 o 2 In the mixed solution, the concentrations are 3mol / L and 0.1mol / L respectively, and react at 20°C for 300s;

[0070] (3) Put the silicon wafer after the previous step into a nitric acid solution with a mass percentage of 69% for 300 seconds, and the cleaning temperature is 20°C;

[0071] (4) Put the silicon wafer after the previous step into a 5% hydrogen fluorine solution for 200 seconds, and the cleaning temperature is 20°C;

[0072] (5) Put the silicon wafer after the previou...

Embodiment 3

[0077] A method for preparing a textured structure of a polycrystalline silicon solar cell, comprising the steps of:

[0078] (1) After removing and cleaning the damaged layer of the P-type polysilicon wafer with a thickness of 180±10 μm and a size of 156mm×156mm, etch and make texture to form a micron-scale texture;

[0079] Then put into AgNO with a concentration of 0.008mol / L 3 In the solution, react at 20°C for 60s;

[0080] (2) Put the silicon wafer after the previous step into HF and H 2 o 2 In the mixed solution, the concentrations are 3mol / L and 0.1mol / L respectively, and react at 20°C for 300s;

[0081] (3) Put the silicon wafer after the previous step into a nitric acid solution with a mass percentage of 69% for 300 seconds, and the cleaning temperature is 20°C;

[0082] (4) Put the silicon wafer after the previous step into a 5% hydrogen fluorine solution for 200 seconds, and the cleaning temperature is 20°C;

[0083] (5) Put the silicon wafer after the previou...

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Abstract

The invention discloses a preparation method of a textured structure of a crystalline silicon solar cell. The method includes the steps of (1) cleaning and texture preparation, (2) soaking a silicon wafer in a solution containing metal ions to enable the surface of the silicon wafer to be coated with a layer of metal nanometer particles, (3) corroding the surface of the silicon wafer to form a nanometer-grade texture, (4) cleaning to remove the metal particles, (5) carrying out microstructure amendment etching in second chemical corrosive liquid, and (6) cleaning and spin-drying. As is proved by a test, the size of the textured structure is between 100nm-500nm; the textured structure is of a nanopore shape with a large hole diameter and a small depth, or a nanometer pyramid with edge angles, or of a nanometer pit shape structure with an edge angle nanometer cone body or with an edge angle; and compared with a nanometer-micrometer composite textured structure disclosed in CN102610692A, the textured structure enables conversion efficiency of a cell piece to be improved by about 0.2%-0.5%, and an unexpected effect is achieved.

Description

technical field [0001] The invention relates to a textured surface structure of a crystalline silicon solar cell and a preparation method thereof, belonging to the technical field of solar energy. Background technique [0002] With the wide application of solar cell components, photovoltaic power generation occupies an increasingly important proportion in new energy and has achieved rapid development. Among the current commercialized solar cell products, crystalline silicon (monocrystalline and polycrystalline) solar cells have the largest market share, maintaining a market share of more than 85%. [0003] At present, in the production process of solar cells, the textured structure on the surface of silicon wafers can effectively reduce the surface reflectance of solar cells, which is one of the important factors affecting the photoelectric conversion efficiency of solar cells. In order to obtain a good textured structure on the surface of crystalline silicon solar cells to...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCH01L31/02363Y02E10/50
Inventor 苏晓东邹帅王栩生章灵军
Owner SUZHOU UNIV
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