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A kind of vanadium dioxide flake film material and preparation method thereof

A technology of vanadium dioxide sheet-like and thin-film material, applied in the field of functional materials, can solve the problems of harsh reaction conditions, unstable product performance, and difficulty in large-scale industrial production, and achieves excellent performance and good controllability of film morphology. Effect

Inactive Publication Date: 2016-09-07
SHANGHAI NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In order to solve the problems encountered in the preparation of vanadium dioxide thin films, such as the magnetron sputtering method first forms a film and then forms a phase during the film formation process, resulting in more impurity phases; the hydrothermal method requires secondary film formation, and the reaction conditions are harsh. The cycle is long, and it is difficult to apply to large-scale industrial production; the product obtained by the sol-gel method is prone to deformation due to shrinkage during annealing treatment, and the product performance is not stable enough. thin film method

Method used

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  • A kind of vanadium dioxide flake film material and preparation method thereof
  • A kind of vanadium dioxide flake film material and preparation method thereof
  • A kind of vanadium dioxide flake film material and preparation method thereof

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Effect test

Embodiment 1

[0026] (1) Take an appropriate amount of vanadyl sulfate and dissolve it in a mixture of deionized water and ethanol at a volume ratio of 1:1, with a concentration of 0.2mol / L;

[0027] (2) Add sodium chloride and dispersant, stir for 20 minutes, and ultrasonically disperse for 30 minutes to obtain a blue clear solution;

[0028] (3) Adjust the pH value of the solution to 2.6-2.7, and let it stand for 3 days;

[0029] (4) Wash and dry the FTO substrate in sequence with ethanol, acetone, hydrochloric acid, and deionized water;

[0030] (5) Put the substrate and electrodes into the electrolyte in parallel with a distance of 2.5cm, apply a DC voltage of 1.5V, and power on for 20 minutes to perform anodic oxidation deposition coating;

[0031] (6) After the deposition, the sample was dried at 100°C for 40 minutes, and then annealed at 510°C for 12 hours in a nitrogen atmosphere to obtain a thin film.

[0032] figure 1 It is the XRD spectrum of the vanadium dioxide flake thin fi...

Embodiment 2- Embodiment 4

[0037] According to the experimental parameters in Table 1, referring to the method of Example 1, vanadium dioxide flake films can be obtained.

[0038] Table 1

[0039]

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Abstract

The invention discloses a vanadium dioxide thin film material and a preparation method thereof. In a certain voltage range, an anodic oxidation method is used to deposit and coat the film, followed by annealing treatment in a certain temperature range to finally obtain a thin film with a sheet structure. The solution used for deposition and film formation uses a mixture of one or more alcohols such as methanol, ethanol, n-propanol and water as a solvent, and the volume ratio of alcohols to water is 0:1-1:1. The tetravalent vanadium compound is used as the solute, and the molar concentration is 0.01-10mol / L. Adjust the pH value of the solution to a certain range, add auxiliary agents and dispersants, and age for a certain period of time. The invention uses an anodic oxidation method to prepare a vanadium dioxide flake film, which has uniform and regular flake shape and high specific surface area. The invention has mild reaction conditions, simple process, high efficiency and low energy consumption, and is suitable for popularization and application.

Description

technical field [0001] The invention belongs to the field of functional materials, and relates to a vanadium dioxide flake film and a preparation method thereof, in particular to applying an anodic oxidation method for depositing and coating, followed by annealing in a certain temperature range, and finally obtaining flakes on the substrate surface at one time. method for thin-film structures. Background technique [0002] Vanadium, a transition metal element, has excellent physical and chemical properties and is known as the metal "vitamin". It is widely used in aerospace, metallurgy, materials, chemical industry, energy, optoelectronics and many other fields. Many vanadium oxides have strange phase transition properties, and vanadium dioxide (VO 2 ) has attracted much attention because the transition temperature is closest to room temperature. The world's most advanced research institutions such as the Oak Ridge National Laboratory in the United States have invested in it...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D11/26
Inventor 许东芳屈钰琦刘志甫李永祥何其庄
Owner SHANGHAI NORMAL UNIVERSITY