Organic field effect transistor and preparation method thereof
A transistor and organic field technology, applied in the field of organic field effect transistors and their preparation, can solve the problems of device performance degradation, failure to meet application requirements, time-consuming and labor-intensive post-annealing process, etc. Effect
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Embodiment 1
[0082] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen after cleaning; spin-coat 100nm PS gate insulating layer on the surface of transparent conductive cathode ITO, and dry the formed film; Spin-coat UV-sensitive adhesive-P3HT organic semiconductor layer (30nm) with a mass ratio of 1:1000 on the gate insulating layer; the raw materials of the UV-sensitive adhesive include the following components:
[0083]
[0084] Wherein the photoinitiator is an acetophenone derivative, the photosensitizer includes thioxanthraquinone and Michler's ketone, and the auxiliary agent includes an antistatic agent, a flame retardant and a coupling agent. After the spin coating, the organic semiconductor layer is cured by ultraviolet light; the gold source electrode and the drain electrode (10nm) are thermally evaporated on the organic semiconductor layer; and then the organic semiconductor layer is cured again. The measured saturati...
Embodiment 2
[0086] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen after cleaning; spin-coat a 600nm PS gate insulating layer on the surface of the transparent conductive cathode ITO, and dry the formed film; Spin-coating UV-sensitive adhesive on the gate insulating layer: P3HT mass ratio of UV-sensitive adhesive-organic semiconductor material composite layer (300nm) with a mass ratio of 1:1000; the weight percent composition of the UV-sensitive adhesive is:
[0087]
[0088]Wherein the photoinitiator is an acetophenone derivative, the photosensitizer includes thioxanthraquinone and Michler's ketone, and the auxiliary agent includes an antistatic agent, a flame retardant and a coupling agent. After the spin coating, the organic semiconductor layer is cured by ultraviolet light; the gold source electrode and the drain electrode (50nm) are thermally evaporated on the organic semiconductor layer; and then the organic semiconduc...
Embodiment 3
[0090] Clean the substrate composed of transparent substrate and transparent conductive ITO, and dry it with nitrogen after cleaning; spin-coat a 400nm PS gate insulating layer on the surface of the transparent conductive cathode ITO, and dry the formed film; Spin-coating UV-sensitive adhesive on the gate insulating layer: P3HT mass ratio of UV-sensitive adhesive-organic semiconductor material composite layer (200nm) with a mass ratio of 3:1000; the weight percentage composition of the UV-sensitive adhesive is:
[0091]
[0092] Wherein the photoinitiator is an acetophenone derivative, the photosensitizer includes thioxanthraquinone and Michler's ketone, and the auxiliary agent includes an antistatic agent, a flame retardant and a coupling agent. After the spin coating, the organic semiconductor layer is cured by ultraviolet light; the gold source electrode and the drain electrode (50nm) are thermally evaporated on the organic semiconductor layer; and then the organic semico...
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