Dental restoration composite resin containing antibacterial monomer and preparation method thereof
A dental restoration and composite resin technology, which is applied in dental preparations, dentistry, dental prosthesis, etc., can solve problems such as insufficient bonding strength and weak antibacterial ability of dental restoration composite resin, and achieve the effect of enhancing the bonding effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0017] The composite resin consists of 25% bisphenol A-glycidyl methacrylate, 1% urethane dimethacrylate, 15% triethylene glycol dimethacrylate, 1% methacryl Oxydodecylpyridine bromide, 56.5% silicon dioxide, 0.5% camphorquinone and 1% N,N-dimethylaminoethyl methacrylate.
[0018] The preparation method of above-mentioned composite resin comprises the following steps:
[0019] (1) Surface modification of silicon dioxide; adding silicon dioxide to a cyclohexane solution of γ-methacryloxypropyltrimethoxysilane (γ-methacryloxypropyltrimethoxysilane The amount of silane is 2% of the silica mass), stirred at room temperature in a magnetic stirrer for 5 hours, and then dried in a drying oven at 100°C for 2.5 hours;
[0020] (2) Stir and blend 1g of antibacterial monomer methacryloyloxydodecyl bromide and 56.5g of modified silicon dioxide in a solvent, and remove the solvent after ultrasonic vibration to disperse to obtain a uniformly dispersed composite filler;
[0021] (3) With 2...
Embodiment 2
[0025] Composite resin consists of 6% bisphenol A-glycidyl methacrylate, 4.5% urethane dimethacrylate, 5% triethylene glycol dimethacrylate, 3% methacryl Oxydodecylpyridine bromide, 80% silicon dioxide, 0.8% camphorquinone and 0.7% N,N-dimethylaminoethyl methacrylate.
[0026] The preparation method of above-mentioned composite resin comprises the following steps:
[0027] (1) Surface modification of silicon dioxide; adding silicon dioxide to a cyclohexane solution of γ-methacryloxypropyltrimethoxysilane (γ-methacryloxypropyltrimethoxysilane The amount of silane is 2% of the silica mass), stirred at room temperature in a magnetic stirrer for 6 hours, and then dried in a drying oven at 120 ° C for 2 hours;
[0028] (2) Stir and blend 3g of antibacterial monomer methacryloyloxydodecyl bromide and 80g of modified silicon dioxide in a solvent, and remove the solvent after ultrasonic vibration to disperse to obtain a uniformly dispersed composite filler;
[0029] (3) With 6g bisp...
Embodiment 3
[0033] Composite resin consists of 1% bisphenol A-glycidyl methacrylate, 20% urethane dimethacrylate, 4% triethylene glycol dimethacrylate, 10% methacryl Oxydodecylpyridine bromide, 63.5% silicon dioxide, 1% camphorquinone and 0.5% N,N-dimethylaminoethyl methacrylate.
[0034] The preparation method of above-mentioned composite resin comprises the following steps:
[0035] (1) Surface modification of silicon dioxide; adding silicon dioxide to a cyclohexane solution of γ-methacryloxypropyltrimethoxysilane (γ-methacryloxypropyltrimethoxysilane The amount of silane is 2% of the silica mass), stirred at room temperature in a magnetic stirrer for 7 hours, and then dried in a drying oven at 150 ° C for 1.5 hours;
[0036] (2) Stir and blend 10g of antibacterial monomer methacryloyloxydodecyl bromide and 63.5g of modified silicon dioxide in a solvent, and remove the solvent after ultrasonic vibration to disperse to obtain a uniformly dispersed composite filler;
[0037] (3) With 1g...
PUM
Property | Measurement | Unit |
---|---|---|
diameter | aaaaa | aaaaa |
wavelength | aaaaa | aaaaa |
bending strength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com