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Preparation method of porous titanium dioxide thin film

A technology of porous titanium dioxide and titanium dioxide, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of restricting large-scale application, narrow range of substrate selection, cost-limited application, etc., and achieve good catalytic performance performance, reduce secondary environmental pollution, and facilitate large-scale industrial production

Active Publication Date: 2014-03-12
UNIV OF JINAN
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Problems solved by technology

The process of the template method is relatively simple, but the material prepared by the template method has a high-temperature calcination template process, which is not suitable for its application on non-temperature-resistant surfaces, and it is easy to cause large internal defects, which limits its large-scale application
The commonly used methods for the film prepared by electrochemical method are anodic oxidation, micro-arc oxidation and electrodeposition, which can deposit uniform porous film on the surface, but its disadvantage is that the film must be deposited on a conductive substrate, and the selection range of the substrate is relatively narrow. The cost factor also limits its application

Method used

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  • Preparation method of porous titanium dioxide thin film
  • Preparation method of porous titanium dioxide thin film
  • Preparation method of porous titanium dioxide thin film

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Effect test

Embodiment 1

[0035] Floating beads of glass beads are selected as the substrate with 40-60 mesh floating beads, and Cu-Zn alloy with 20% Cu and the rest of Zn is used as the target material. -3 At this time, high-purity argon was introduced, and the pressure in the vacuum chamber was adjusted to 1.0Pa; the DC sputtering power was 100W; the substrate temperature was room temperature, and the sputtering time was 60min. The acidic solution is hydrochloric acid for dealloying treatment; the Cu-Zn alloy thin film reacts with 3% acidic solution for 40 minutes; microbeads wrapped with porous copper are placed in the sputtering chamber to deposit titanium dioxide, and the target material composition is 99.9% pure Titanium dioxide, using radio frequency magnetron sputtering method, the vacuum degree reaches 1.5×10 -3 At this time, high-purity argon gas was introduced, and the pressure in the vacuum chamber was adjusted to 1.0 Pa; the substrate temperature was 100 °C, and the sputtering time wa...

Embodiment 2

[0038] Floating beads of glass beads are selected to select 40-60 mesh floating beads as the substrate, and an alloy of 30% Cu and the rest is Zn is used as the target material. Using DC magnetron sputtering method, the vacuum degree reaches 1.2×10 -3 At this time, high-purity argon gas was introduced, and the pressure in the vacuum chamber was adjusted to 0.8Pa; the DC sputtering power was 160W; the substrate temperature was room temperature, and the sputtering time was 30min. The acidic solution is hydrochloric acid for dealloying treatment; the Cu-Zn alloy thin film reacts with 3% acidic solution for 40 minutes; microbeads wrapped with porous copper are placed in the sputtering chamber to deposit titanium dioxide, and the target material composition is 99.9% pure Titanium dioxide, using radio frequency magnetron sputtering method, the vacuum degree reaches 1.5×10 -3 At this time, high-purity argon gas was introduced, and the pressure in the vacuum chamber was adjusted to 1...

Embodiment 3

[0040] Glass beads are floated, and 40-60 mesh floating beads are selected as the substrate, and an alloy of 20% Cu and the rest is Mn is used as the target material. Using DC magnetron sputtering method, the vacuum degree reaches 1.2×10 -3 At this time, high-purity argon was introduced, and the pressure in the vacuum chamber was adjusted to 1.0Pa; the DC sputtering power was 120W; the substrate temperature was room temperature, and the sputtering time was 30min. The acidic solution is hydrochloric acid for dealloying treatment; the Cu-Mn alloy film reacts with 3% acidic solution for 40 minutes; microbeads wrapped with porous copper are placed in the sputtering chamber to deposit titanium dioxide, and the target material composition is 99.9% pure Titanium dioxide, using radio frequency magnetron sputtering method, the vacuum degree reaches 1.5×10 -3 At this time, high-purity argon gas was introduced, and the pressure in the vacuum chamber was adjusted to 1.2 Pa; the substrate...

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Abstract

The invention relates to a preparation method of a porous titanium dioxide thin film, which comprises the following steps: using hollow glass beads as matrices, using Cu-Zn or Cu-Mn alloy as a target and depositing a Cu-Zn or Cu-Mn alloy thin film by magnetron sputtering equipment; carrying out dealloying processing by adopting an acid or alkali solution, then cleaning to a neutral state by deionized water and carrying out vacuum drying; after drying, coating the porous copper glass beads and carrying out surface deposition of titanium dioxide by the magnetron sputtering equipment to obtain porous titanium dioxide. The porous titanium dioxide thin film prepared by the preparation method increases the surface area of titanium dioxide, has better catalysis performance under the irradiation of ultraviolet light and can have wider application prospect in the fields of wastewater treatment, air purification and photocatalysis.

Description

technical field [0001] The invention relates to the field of porous material preparation, in particular to a preparation method for preparing a porous titanium dioxide film on the surface of glass microspheres. Background technique [0002] With the rapid development of industry, our living environment continues to deteriorate, and people gradually pay more and more attention to the protection of the environment and the control of pollutants. As a decontamination technology with large surface area, strong decontamination ability, low energy consumption, no secondary pollution and large-scale application, semiconductor oxide porous photocatalytic material has become a research hotspot. Among the many semiconductor oxide porous membranes, titanium dioxide porous membrane photocatalytic materials will be more widely used in the fields of wastewater treatment, air purification and biological sterilization due to their strong oxidation ability and high catalytic activity. [000...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08C23C14/18C23C14/02C23F4/00
Inventor 冷金凤周庆波初梅军滕新营耿浩然
Owner UNIV OF JINAN
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