A dome-type microwave plasma chemical vapor deposition diamond film device

A technology of microwave plasma and chemical vapor deposition, which is applied in the direction of gaseous chemical plating, electrical components, metal material coating technology, etc., to achieve the effect of uniform deposition

Active Publication Date: 2015-12-30
HEBEI PLASMA DIAMOND TECH
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The dome-type MPCVD device has a reasonable quartz microwave window design, a double tuning mechanism, a good water cooling system, and there is no phenomenon of impurity carbon depositor walls, which fundamentally solves the problem of various existing MPCVD diamond film deposition devices. Problems in the process of preparing high-quality diamond films under high power

Method used

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  • A dome-type microwave plasma chemical vapor deposition diamond film device
  • A dome-type microwave plasma chemical vapor deposition diamond film device
  • A dome-type microwave plasma chemical vapor deposition diamond film device

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Embodiment 1

[0031] Utilize the dome type MPCVD diamond film deposition device that the present invention proposes, carried out the deposition of high-quality diamond film, experimental process is as follows:

[0032] (1) Turn on the chiller, from the top coaxial waveguide converter 1 to the middle cylindrical loop antenna 2 to the bottom adjustable center deposition table 8 and adjustable edge deposition table 9, and the entire cylindrical shell 3, All parts through which the microwave propagates are water-cooled;

[0033] (2) Turn on the mechanical pump to evacuate the resonance cavity to below 1Pa;

[0034] (3) The hydrogen gas and the methane gas with a flow rate of 400ml / min and 20ml / min are respectively introduced into the resonance cavity through the intake pipe 13;

[0035] (4) Adjust the valve size of the mechanical pump so that the gas pressure in the resonance chamber is around 800Pa;

[0036] (5) Turn on the microwave power supply, input the microwave 12 with a frequency of 2...

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Abstract

A dome-type microwave plasma chemical vapor deposition diamond film device , suitable for rapid preparation of high-quality diamond films under high-power microwave input. The main body of the resonant cavity is composed of a dome reflector, a metal sheet reflector, a quartz ring window, a cylindrical reflector and a deposition platform. The reflector of the thin metal plate can block the propagation of the microwave to the top of the resonant cavity, so that the microwave can be more concentrated on the substrate. The deposition platform is divided into two parts, the central deposition platform and the edge deposition platform. The independent up and down movement functions of the two parts are conducive to the rapid optimization of the plasma state. The quartz ring window is hidden between the slits formed by the walls of the resonant cavity, which can avoid plasma etching and improve the vacuum performance of the resonant cavity. In addition, good water cooling system design ensures the safety of equipment running under high power. The combination of many advantages makes the dome-type microwave plasma chemical vapor deposition device capable of depositing high-quality diamond films at high speeds at high power levels.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, and provides a dome-type microwave plasma chemical vapor deposition device, which is suitable for depositing high-quality diamond films under high power. Background technique [0002] The chemical vapor deposition method of depositing solid materials on the surface of the substrate through the chemical reaction of the reactive gas is a good method for preparing uniform thin film materials. Among them, the hot wire method, DC arc spray method, and microwave plasma method have been successfully applied to diamond films. preparation. [0003] The diamond film material integrates a variety of excellent properties, such as high hardness, high thermal conductivity, high light transmittance, high resistivity, etc., and can be used to make wear-resistant coatings, acoustic diaphragms, optical windows, and high thermal conductivity of integrated circuits. Substrate etc. According to di...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/511C23C16/27
CPCH01J37/32192C23C16/274C23C16/511H01J37/32247H01J37/32256
Inventor 唐伟忠苏静杰李义锋刘艳青丁明辉李小龙姚鹏丽
Owner HEBEI PLASMA DIAMOND TECH
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