Etching solution composition for titanium-aluminum-titanium metal laminated membrane
A technology of composition and etching solution, which is applied in the field of etching solution, can solve the problems of high cost and limitation, and achieve the effects of reducing production cost, reducing the amount of side etching, and improving the uniformity of etching
Active Publication Date: 2014-03-26
JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
View PDF8 Cites 11 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
For this titanium-aluminum-titanium three-layer metal laminated film, a kind of etchant composition of fluoride+nitric acid or methanesulfonic acid oxidant that does not contain hydrofluoric acid has also been developed (such as the Chinese patent application number 200610009536.5, Japanese Patent Application Publication No. 2007-67367), the oxidizing agent may also contain a certain oxidizing salt as an auxiliary oxidizing agent other than nitric acid or methanesulfonic acid, and the cation in the oxidizing salt is only used as a counter ion of the auxiliary oxidizing agent. This patent does not include The role of cations is not mentioned, and the auxiliary oxidizing agents used are limited to oxidizing salts or oxidizing acids, and the cost is high
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1~6
[0026] Titanium is deposited on a glass substrate by sputtering -aluminum -titanium the substrate.
[0027] Then, the titanium-aluminum-titanium metal laminated film was patterned with a resist, and immersed in the etching solution of Examples 1 to 6 in Table 1 (etching temperature: 30° C.). Thereafter, after washing with ultrapure water and drying with nitrogen gas, the shape of the substrate was observed with an electron microscope. The results are shown in Table 1.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Login to view more
Abstract
The invention relates to an etching solution composition for a titanium-aluminum-titanium metal laminated membrane consisting of a titanium metal membrane, an aluminum metal membrane and a titanium metal membrane. The composition consists of fluorides, oxidizing acid, non-oxidizing alkali metal salt and water, wherein the non-oxidizing alkali metal salt is preferentially at least one of water-soluble lithium, potassium and sodium salts; the mass percent concentration of the fluorides, the oxidizing acid and the non-oxidizing alkali metal salt are 0.01-5 percent, 0.1-30 percent and 0.0004-0.35 percent, respectively. Compared with the prior art, the etching solution composition has the advantages that the three laminated metal membranes can be etched together, the lateral erosion amount can be effectively reduced, the etching uniformity is improved, and the obtained taper angle is 25 degrees below. In addition, the etching solution composition adopts low-price non-oxidizing salts or mixtures thereof instead of high-price salt-type auxiliary oxidants, so that the production cost is reduced, and the balance between the cost and performance is achieved.
Description
technical field [0001] The invention relates to an etchant suitable for wet etching metal layers in the manufacture of semiconductor devices, in particular to an etchant composition for a titanium-aluminum-titanium metal laminated film composed of a titanium metal film, an aluminum metal film and a titanium metal film. Background technique [0002] Because aluminum or aluminum alloy is cheap and has very low resistance, it is often used in materials such as gates, sources and drains of liquid crystal displays. However, due to the poor adhesion between aluminum or aluminum alloy and the glass substrate as the base film, it is easily corroded by chemical liquid and heat, so titanium or titanium alloy is used to form a laminated film on the lower part of aluminum or aluminum alloy for electrode materials . At present, the industry has developed a new type of three-layer metal laminated film, which includes an upper layer made of titanium or a titanium base layer mainly made of...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Application Information
Patent Timeline
Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/20C23F1/26
Inventor 殷福华邵勇朱龙
Owner JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Try Eureka
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap