Titanium dioxide/cadmium sulfide/titanium dioxide composite film and application thereof
A technology of titanium dioxide and composite thin films, applied in chemical/physical processes, physical/chemical process catalysts, chemical instruments and methods, etc., to achieve the effects of improving catalytic efficiency, low cost, and simple methods
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Embodiment 1
[0028] (1) Ultrasonic cleaning of the glass substrate 1 with acetone, alcohol, and deionized water one by one and drying;
[0029] (2) Fixing the pretreated glass substrate 1 on the sample stage of the electron beam evaporation coating machine;
[0030] (3) Titanium is used as the target material, and the target material is image 3 Medium solid matter 4 and molten matter 5, the chamber of the electron beam evaporation coating machine is pumped to 3×10 -8 ~5×10 -8 Torr's High Vacuum;
[0031] (4) Adjust the incident angle of the electron beam 6 from 3 to 85 degrees, and make the sample stage stand still or rotate at a rate of 10 rpm, and grow a 300nm thick titanium deposition film obliquely on the substrate 1 of the sample stage;
[0032] (5) Titanium dioxide nanorod array film was obtained by annealing the titanium nanorod array film at 450°C in air for 2 hours;
[0033] (6) Deposit cadmium sulfide nanoparticles on titanium dioxide nanorods by continuous ion layer adsorpt...
Embodiment 2
[0037] (1) Ultrasonic cleaning of the glass substrate 1 with acetone, alcohol, and deionized water one by one and drying;
[0038] (2) Fixing the pretreated glass substrate 1 on the sample stage of the electron beam evaporation coating machine;
[0039] (3) Titanium is used as the target material, and the target material is image 3 Medium solid matter 4 and molten matter 5, the chamber of the electron beam evaporation coating machine is pumped to 3×10 -8 ~5×10 -8 Torr's High Vacuum;
[0040] (4) Adjust the incident angle of the electron beam 6 from 3 to 85 degrees, and make the sample stage stand still or rotate at a rate of 10 rpm, and grow a 300nm thick titanium deposition film obliquely on the substrate 1 of the sample stage;
[0041] (5) Titanium dioxide nanorod array film was obtained by annealing the titanium nanorod array film at 450°C in air for 2 hours;
[0042] (6) Deposit cadmium sulfide nanoparticles on titanium dioxide nanorods by continuous ion layer adsorpt...
Embodiment 3
[0046] (1) Ultrasonic cleaning of the glass substrate 1 with acetone, alcohol, and deionized water one by one and drying;
[0047] (2) Fixing the pretreated glass substrate 1 on the sample stage of the electron beam evaporation coating machine;
[0048] (3) Titanium is used as the target material, and the target material is image 3 Medium solid matter 4 and molten matter 5, the chamber of the electron beam evaporation coating machine is pumped to 3×10 -8 ~5×10 -8 Torr's High Vacuum;
[0049] (4) Adjust the incident angle of the electron beam 6 from 3 to 85 degrees, and make the sample stage stand still or rotate at a rate of 10 rpm, and grow a 300nm thick titanium deposition film obliquely on the substrate 1 of the sample stage;
[0050] (5) Titanium dioxide nanorod array film was obtained by annealing the titanium nanorod array film at 450°C in air for 2 hours;
[0051] (6) Deposit cadmium sulfide nanoparticles on titanium dioxide nanorods by continuous ion layer adsorpt...
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