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Photosensitive resin composition and insulating layer made thereof

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve problems such as residual rate reduction, pattern damage, film diffusion, etc., and achieve the effect of easy processing

Active Publication Date: 2019-10-01
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the sensitivity can be improved by increasing the solubility of the alkaline developer in the polymer used in the organic insulating film or prolonging the developing time, this method has limitations and may cause the non-exposed part to dissolve together with the exposed part, resulting in Residue rate reduction throughout the membrane
This result causes problems of film diffusion and pattern damage in substrates for large-sized displays

Method used

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  • Photosensitive resin composition and insulating layer made thereof
  • Photosensitive resin composition and insulating layer made thereof
  • Photosensitive resin composition and insulating layer made thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0139] The method for preparing an insulating layer according to the present invention may include: applying the photosensitive resin composition of the present invention to the top of a substrate for a display device or a source / drain electrode or a silicon nitride layer provided on the substrate pre-baking the photosensitive resin composition; selectively exposing and developing the photosensitive resin composition to form a pattern; and fully exposing and heating, or only heating the photosensitive resin composition.

[0140] The substrate can be prepared using glass or a transparent plastic resin as a main material, which is generally used in the manufacture of liquid crystal display devices or organic electroluminescent displays, and the like. However, such materials are not particularly limited, but may depend on the characteristics of a display device to be used. For example, a metal film may be provided to form a gate electrode on an insulating substrate such as a glas...

Embodiment 1-8

[0148] Embodiment 1-8 and comparative example

[0149] Spin coating compositions were prepared using the components listed in Table 1 at their respective levels (wt %).

[0150] [Table 1]

[0151]

[0152]

experiment example

[0154] For the resin compositions prepared according to Examples and Comparative Examples, the following evaluation experiments were performed, and the results are shown in Table 2 below.

[0155] (1) Sensitivity

[0156] Each photosensitive resin composition according to Examples 1-8 and Comparative Example was applied onto a glass substrate having a thickness of 0.7 mm (Corning 1737, manufactured by Corning co.), followed by heating it on a hot plate at 100° C. The solvent was volatilized for 125 seconds to form a photosensitive resin composition layer with a thickness of 4.0 μm.

[0157] Then, in order to obtain a contact hole pattern with a diameter of 10 μm, exposure was performed by means of an i-ray lithography machine (NSR-205i11D, manufactured by Nikon. Co.) using a mask having a square pattern opening with a size of 10 μm.

[0158] After exposure, the substrate was subjected to puddle development at 23°C for 40 seconds using a 2.38% tetramethylammonium hydroxide sol...

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Abstract

The present invention relates to a photosensitive resin composition and an insulating layer manufactured from the same, and more specifically, to a photosensitive resin composition and an insulating layer manufactured from the same, wherein the composition improves sensitivity and resolution by including a binder resin which is polymerized by including a monomer represented by chemical formula 1, facilitates processing by improving fluidity, and enables the adjustment of the slope of patterns.

Description

technical field [0001] The present invention relates to a photosensitive resin composition having excellent sensitivity and degradation ability and capable of controlling the angle of a formed pattern, and an insulating layer prepared using the same. Background technique [0002] For display devices such as thin film transistor (TFT) liquid crystal display devices, inorganic protective layers such as silicon nitride have generally been used as protective films for protecting and insulating TFT circuits, however, this involves difficult Increase the aperture ratio. In order to overcome the above-mentioned problems, there is a tendency that demand for organic insulating films having a low dielectric constant increases. [0003] For such an organic insulating film as described above, a photosensitive resin formed of a polymer compound that undergoes a chemical reaction to have different solubility to a specific solvent upon exposure to light or electron beams is generally used...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/039G03F7/004
CPCG02F1/13G02F1/1303G03F7/004G03F7/0045G03F7/016G03F7/028G03F7/11
Inventor 崔和燮朴汉雨任玟柱
Owner DONGWOO FINE CHEM CO LTD
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