A ceria-based electrolyte film with preferred orientation and its preparation and application
An electrolyte film, preferential orientation technology, applied in circuits, fuel cells, electrical components, etc., can solve the problem of inability to prepare cerium oxide-based electrolyte films, and achieve the effect of improving electrocatalytic performance, improving ohmic resistance, and reducing ohmic resistance.
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Embodiment 1
[0020] In nickel oxide and Y 2 O 3 Stable ZrO 2 Composite anode / Y 2 O 3 Stable ZrO 2 Sputtering dense Gd with a preferred orientation of (100) on the membrane electrode (NiO-YSZ / YSZ) 2 O 3 Doped CeO 2 (Gd 0.1 Ce 0.9 O 1.95 1) Electrolyte separator, ultrasonically clean the anode-supported membrane electrode with acetone, ethanol, and distilled water and dry, then put it into the vacuum chamber of the magnetron sputtering instrument, adjust the target base distance to about 6cm, and use cerium / Gadolinium alloy material is the target material, the purity of the target material is above 99.99%, the molar ratio of cerium / gadolinium is 9 / 1, and the vacuum is 8*10 -4 Pa, then heat the substrate stage, the temperature is stabilized to 400℃, the flow of argon gas is 10.0sccm, the flow of oxygen is 1.2sccm, and the sputtering power is 9W / cm 2 , The sputtering pressure is 0.5Pa, the rotation speed of the substrate table is set to 5 turns / min, and the thickness is about 500nm. After complet...
Embodiment 2
[0022] In nickel oxide and Y 2 O 3 Stable ZrO 2 Composite anode / Sc 2 O 3 Stable ZrO 2 The sputtering texture orientation is (110) dense Gd on the membrane electrode (NiO-YSZ / ScSZ) 2 O 3 Doped CeO 2 (Gd 0.2 Ce 0.8 O 1.9 ) Electrolyte separator, adjust the target base distance to about 7cm, use cerium / samarium alloy material as the target, the purity is above 99.9%, the cerium / samarium molar ratio is 8 / 2, and the vacuum is 8*10 -4 Pa, then heat the substrate stage, the temperature is stabilized to 300℃, the flow of argon gas is 40.0sccm, the flow of oxygen is 5.0sccm, and the sputtering power is 8W / cm 2 , The sputtering pressure is 1.0Pa, the thickness is about 600nm, the rotation speed of the substrate stage is set to 10 turns / min, and the dense Gd is completed 0.2 Ce 0.8 O 1.9 After the sputtering of the interlayer, the dense Gd with the sputtering texture orientation of (110) on the membrane electrode (NiO-YSZ / ScSZ) was detected by XRD 2 O 3 Doped CeO 2 (Gd 0.2 Ce 0.8 O 1.9 ) Elec...
example 3
[0024] Dense Sm with (110) texture orientation was sputter deposited on NiO-SDC anode substrate 2 O 3 Doped CeO 2 (Sm 0.2 Ce 0.8 O 1.9 ) Electrolyte layer, adjust the target base distance to about 6cm, use cerium / samarium alloy material as the target, the purity is above 99.9%, the cerium / samarium molar ratio is 8 / 2, and the vacuum is 8*10 -4 Pa, then heat the substrate stage, the temperature is stabilized to 400℃, the flow of argon gas is 40.0sccm, the flow of oxygen is 5.0sccm, and the sputtering power is 8W / cm 2 , The sputtering pressure is 0.8Pa, the thickness is about 600nm, the rotation speed of the substrate table is set to 10 turns / minute, and the Ba 0.5 Sr 0.5 Co 0.8 Fe 0.2 O 3 (BSCF) and Sm 0.2 Ce 0.8 O 1.9 Composite material (Sm 0.2 Ce 0.8 O 1.9 The mass fraction of 30wt.%) is the cathode. The battery performance test is carried out on the four-terminal battery test device. Air is the cathode gas and the wet hydrogen is the anode gas. The maximum power density of the bat...
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