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Graphical substrate and inverted LED chip and manufacturing method thereof

A patterned substrate, LED chip technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of reducing chip life, reducing chip light output, increasing chip voltage, etc., to achieve the effect of improving light output efficiency and reducing light reflection

Inactive Publication Date: 2014-07-09
HANGZHOU SILAN AZURE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Most of the commercialized LED chips are grown on the sapphire substrate, and then fixed on the packaging bracket, which leads to the following problems: 1) It mainly dissipates heat through conduction, and the sapphire substrate is thick, so the heat is difficult to export, The accumulation of heat on the chip affects the reliability of the chip, increases the light decay and reduces the life of the chip; 2) Due to the light blocking of the electrode, the light output of the chip will be reduced, resulting in the problem of low light efficiency; 3) The current crowding will increase the voltage of the chip, these 4) The packaging is complicated, and the voltage of a single LED chip is about 3V, so it needs to be transformed or packaged to connect it in series, which increases the difficulty of packaging and application, and the process difficulty increases, making the whole chip poor reliability
However, since the refractive index of sapphire is lower than that of gallium nitride, the material of the epitaxial layer, the light emitted from the epitaxial layer will be reflected at the interface between the epitaxial layer and the sapphire substrate, resulting in more light not being emitted and affecting the light extraction efficiency.

Method used

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  • Graphical substrate and inverted LED chip and manufacturing method thereof
  • Graphical substrate and inverted LED chip and manufacturing method thereof
  • Graphical substrate and inverted LED chip and manufacturing method thereof

Examples

Experimental program
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Embodiment 1

[0055] Figure 2a ~ 2gIt is a cross-sectional view of structures in each step of the method for manufacturing a patterned substrate according to Embodiment 1 of the present invention.

[0056] Such as Figure 2a As shown, a substrate 201 having a first side and a second side is provided. The substrate 201 is made of a light-transmitting material, for example, it can be sapphire, silicon carbide (SiC), zinc oxide (ZnO), spinel (MgAL 2 o 4 ). In this embodiment, the substrate 201 is a sapphire substrate.

[0057] continue to refer Figure 2a , forming a hard mask layer 202 on the first surface of the substrate 201 . The hard mask layer 202 is preferably silicon dioxide (SiO2). The silicon dioxide may be formed by chemical vapor deposition (CVD), such as plasma enhanced chemical vapor deposition (PECVD), and its thickness is, for example, 0.5-10 μm. The hard mask layer is used as a mask for the subsequent process of forming pits, so its thickness depends on the size of th...

Embodiment 2

[0074] Figure 3a-3e It is a cross-sectional view of the structure in each step of the patterned substrate manufacturing method according to the second embodiment of the present invention.

[0075] Such as Figure 3a As shown, a substrate 301 is provided. The substrate 301 is made of a light-transmitting material, for example, it can be sapphire, silicon carbide (SiC), zinc oxide (ZnO), spinel (MgAL 2 o 4 ). In this embodiment, the substrate 301 is a sapphire substrate.

[0076] continue to refer Figure 3a , forming a photoresist 303 on the surface of the substrate 301 . The thickness of the photoresist is, for example, 1-2 μm.

[0077] refer to Figure 3b , a patterned photoresist can be formed through coating, exposure and development processes. The patterned photoresist includes a plurality of cylindrical photoresist stages, the cylindrical photoresist stage means that the photoresist stage is circular when viewed from above (parallel to the surface direction of t...

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Abstract

The invention provides a graphical substrate and an inverted LED chip and a manufacturing method thereof. A concave pit is formed on the surface of a substrate, the concave pit is filled with an insulation medium film, translucent material is adopted by a substrate and the insulation medium film, the refractive index of the insulation medium film is between the refractive index of the substrate and the refractive index of an epitaxial layer, thereby forming a refractive index gradient, that is, a micro lens is embedded on the surface of the substrate, the embedded micro lens can have a focus effect and can reduce light reflection to guarantee that luminous energy can be transmitted out from the light output surface of the substrate to the maximum degree, so that the light output efficiency of the inverted LED is improved.

Description

technical field [0001] The invention relates to the field of semiconductor optoelectronic chip manufacturing, in particular to a patterned substrate, a flip-chip LED chip and a manufacturing method thereof. Background technique [0002] Semiconductor light-emitting diode (LED) is a new type of solid-state cold light source, which has many advantages such as high energy efficiency, long life, small size, and low voltage, making it widely used in people's daily life. For example, LEDs are widely used in traffic lights, car headlights, outdoor displays, mobile phone backlights, electrical indicator lights, and some lighting street lights. Especially in terms of energy saving and environmental protection, LED lamps have obvious advantages over ordinary incandescent lamps and fluorescent lamps, so it has become a consensus that they will replace traditional light sources as the main lighting source in the future. [0003] At present, most LED epitaxial layers are prepared on het...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/02H01L33/20H01L33/22
CPCH01L33/20H01L33/22
Inventor 张昊翔江忠永
Owner HANGZHOU SILAN AZURE
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