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Self-cleaning anti-reflection film and preparation method thereof

A technology of self-cleaning and anti-reflection coatings, which is applied in the fields of self-cleaning anti-reflection coatings and their preparation methods, self-cleaning optical materials, and surface treatment. It can solve problems such as harsh operating conditions, complicated process routes, and expensive equipment, and achieve stability Good, simple process, high industrial value effect

Inactive Publication Date: 2014-07-30
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the process routes involved in the literature are usually complicated, the equipment used is expensive, and the operating conditions are harsh.

Method used

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  • Self-cleaning anti-reflection film and preparation method thereof
  • Self-cleaning anti-reflection film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] This example is the preparation of self-cleaning anti-reflection film. The specific process is: use concentrated sulfuric acid (98wt%) and hydrogen peroxide (30wt%) aqueous solution to prepare a glass washing solution at a volume ratio of 3:1, soak the glass substrate in the glass washing solution for 5 minutes, and then wash it in deionized water and acetone respectively. Sonicate for 20 minutes, then treat with 5 mol / L sodium hydroxide aqueous solution at room temperature for 5 minutes, wash with deionized water, and dry with blast at room temperature to obtain an activated glass substrate; mix 2 mL of ethyl orthosilicate with 1 mL of dimethyldiethoxysilane , was added to 60mL of absolute ethanol to obtain a mixed silane solution, then 1mL of concentrated ammonia water (25wt%) was added dropwise to the above mixed silane solution, and stirred at room temperature for 1h to obtain a small particle silica alkaline nanoparticle sol; Small particle silica alkaline nanopart...

Embodiment 2

[0018] This example is the preparation of self-cleaning anti-reflection film. The specific process is: use concentrated sulfuric acid (98wt%) and hydrogen peroxide (30wt%) aqueous solution to prepare a glass washing solution at a volume ratio of 3:1, soak the glass substrate in the glass washing solution for 5 minutes, and then wash it in deionized water and acetone respectively. Sonicate for 20 minutes, then treat with 5 mol / L sodium hydroxide aqueous solution at room temperature for 5 minutes, wash with deionized water, and dry with blast at room temperature to obtain an activated glass substrate; mix 2 mL of ethyl orthosilicate with 1 mL of dimethyldiethoxysilane , was added to 60mL of absolute ethanol to obtain a mixed silane solution, then 1.5mL of concentrated ammonia water (25wt%) was added dropwise to the above mixed silane solution, and stirred at room temperature for 2 hours to obtain a small particle silica alkaline nanoparticle sol; Gained small particle silica alk...

Embodiment 3

[0020]This example is the preparation of self-cleaning anti-reflection film. The specific process is: use concentrated sulfuric acid (98wt%) and hydrogen peroxide (30wt%) aqueous solution to prepare a glass washing solution at a volume ratio of 3:1, soak the glass substrate in the glass washing solution for 5 minutes, and then wash it in deionized water and acetone respectively. Sonicate for 20 minutes, then treat with 5 mol / L sodium hydroxide aqueous solution at room temperature for 5 minutes, wash with deionized water, and air-dry at room temperature to obtain an activated glass substrate; mix 4 mL of ethyl orthosilicate with 2 mL of dimethyldiethoxysilane , was added to 120mL of absolute ethanol to obtain a mixed silane solution, then 2mL of concentrated ammonia water (25wt%) was added dropwise to the above mixed silane solution, and stirred at room temperature for 1.5h to obtain a small particle silica alkaline nanoparticle sol; Gained small particle silica alkaline nanopa...

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Abstract

The invention relates to a self-cleaning anti-reflection film and a preparation method thereof, belongs to the field of novel materials and particularly belongs to the field of self-cleaning optical materials. The preparation method disclosed by the invention comprises the steps of firstly preparing small particle silicon dioxide alkaline nano-particle sol and performing spin coating in two steps by controlling spin coating rotational speed so as to simply and controllably obtain a two-stage micro-surface rough structure required by the self-cleaning anti-reflection film; performing fluorination modification by taking a small molecular fluorine-containing compound as a modifier and taking polymethyl methacrylate with excellent film-forming performance and light transmission as a film-forming solution so as to prepare the self-cleaning anti-reflection film. The obtained anti-reflection film can achieve super non-wetting self-cleaning high standard, integrate excellent light transmittance and well realize high light transmittance and hydrophobic and oleophobic balance. The preparation method provided by the invention has the advantages of simple process, easiness in control, strong weathering resistance, good stability and very high industrialization value.

Description

technical field [0001] A self-cleaning antireflection film and a preparation method thereof, the invention belongs to the field of new materials, in particular to the field of self-cleaning optical materials. It specifically relates to the technical fields of preparation of inorganic nanometer materials, preparation of optical coating films, and surface treatment. Background technique [0002] Anti-reflection coatings have the ability to increase the light transmittance of optical components, and are widely used in optical equipment, solar cells, and laser systems. Although the preparation technology of glass anti-reflection coating has been well developed, it is still difficult to meet the requirements of practical applications. The main performance is that the anti-reflection coating with a porous structure has insufficient weather resistance, and it will absorb water vapor in the environment during use, resulting in light transmission. In the environment of oil mist, it ...

Claims

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Application Information

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IPC IPC(8): C03C17/23
Inventor 顾文秀邹路易杨光东刘世伟李磊王玉如卢先领陈凤凤
Owner JIANGNAN UNIV
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