A kind of preparation method of amorphous silicon film with columnar discrete structure
An amorphous silicon thin film and columnar technology, which is applied in the field of amorphous silicon thin film preparation, can solve problems such as limited energy reserves, and achieve the effects of simple operation, improved monolayer and close-packed properties, and improved light absorption rate.
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Embodiment 1
[0031] 1. Pretreatment of glass substrate:
[0032] Cut the glass slides into 3cm×3cm square pieces, clean them with acetone, absolute ethanol, and deionized water in sequence, and immerse them in concentrated H 2 SO 4 (mass fraction is 98%) and H 2 o 2 (mass fraction is 30%) in the mixed solution that volume ratio is 3: 1, take out after soaking 8 hours, with strong ammoniacal liquor (mass fraction is 25%), H 2 o 2 (mass fraction is 30%) and deionized water volume ratio of 1:1:3 mixed solution ultrasonically cleaned, cleaned with deionized water and stored in a liquid seal for later use;
[0033] 2. The preparation of a single-layer close-packed PS bead array, the process is as follows figure 1 shown.
[0034] (1) Supersonicate the aqueous solution of PS beads with a mass fraction of 10% for preliminary dispersion for 5 minutes. The diameter of the PS beads is 200nm. Mix and dilute the aqueous solution of PS beads with deionized water until the mass fraction is 0.3%, an...
Embodiment 2
[0048] 1. Pretreatment of glass substrate:
[0049] Cut the glass slides into 3cm×3cm square pieces, clean them with acetone, absolute ethanol, and deionized water in sequence, and immerse them in concentrated H 2 SO 4 (mass fraction is 98%) and H 2 o 2 (mass fraction is 30%) in the mixed solution that volume ratio is 3: 1, take out after soaking 8 hours, with strong ammoniacal liquor (mass fraction is 25%), H 2 o 2 (mass fraction is 30%) and deionized water volume ratio of 1:1:3 mixed solution ultrasonically cleaned, cleaned with deionized water and stored in a liquid seal for later use;
[0050] 2. The preparation of a single-layer close-packed PS bead array, the process is as follows figure 1 shown.
[0051] (1) Supersonicate the PS bead solution with a mass fraction of 10% for 5 minutes for preliminary dispersion, the diameter of the PS bead is 500nm, mix and dilute the PS bead solution with deionized water until the mass fraction is 0.3%, and then take The diluted ...
Embodiment 3
[0065] 1. Pretreatment of glass substrate:
[0066] Cut the glass slides into 3cm×3cm square pieces, clean them with acetone, absolute ethanol, and deionized water in sequence, and immerse them in concentrated H 2 SO 4 (mass fraction is 98%) and H 2 o 2 (mass fraction is 30%) in the mixed solution that volume ratio is 3: 1, take out after soaking 8 hours, with strong ammoniacal liquor (mass fraction is 25%), H 2 o 2 (mass fraction is 30%) and deionized water volume ratio of 1:1:3 mixed solution ultrasonically cleaned, cleaned with deionized water and stored in a liquid seal for later use;
[0067] 2. The preparation of a single-layer close-packed PS bead array, the process is as follows figure 1 shown.
[0068] (1) Preliminarily disperse the PS pellet solution with a mass fraction of 10% by ultrasonication for 5 minutes. The diameter of the PS pellet is 1000 nm. Mix and dilute the PS pellet solution with deionized water until the mass fraction is 0.3%, and then take the ...
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