Large-sized ruthenium-based alloy sputtering target and preparation method thereof

A technology of ruthenium-based alloy and sputtering target, which is applied in the field of large-scale ruthenium-based alloy sputtering target and preparation, to achieve the effects of improving film thickness uniformity, uniform composition, and uniform structure

Active Publication Date: 2014-09-10
SINO PLATINUM METALS CO LTD
11 Cites 14 Cited by

AI-Extracted Technical Summary

Problems solved by technology

Document 4 (Journal "Rare Metal Materials and Engineering", 2009, 38(5): 909-913) discloses a mechanical alloying method to prepare Ru 50 Al 50 The method of a...
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Abstract

The invention discloses a large-sized ruthenium-based alloy sputtering target and a preparation method thereof. The ruthenium-based alloy target comprises one or more of Al, Co, Cr and the like and the balance of Ru and is in a cake shape, wherein the diameter of the target is not less than 100mm, the density is not less than 99.5%, the density difference between the central zone and the marginal zone of the target does not exceed 0.3%, and a second phase formed by the Ru and other alloy elements is uniformly distributed in an Ru matrix phase. The preparation method for the ruthenium-based alloy sputtering target comprises the steps of preparing brittle phase ruthenium-based alloy powder with relatively low melting point through a gas atomization method, treating the brittle phase through an air-current mill to obtain fine and uniform alloy powder, and sintering the powder to obtain the ruthenium-based alloy target of which the diameter is more than 100mm. The alloy target is low in impurity content, high and uniform in density, uniform in component distribution and fine and uniform in grains, a coating sputtered by using the target is uniform in thickness and stable in performance, and the phenomena of abnormal discharge and the like in the sputtering process are reduced.

Application Domain

Technology Topic

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  • Large-sized ruthenium-based alloy sputtering target and preparation method thereof
  • Large-sized ruthenium-based alloy sputtering target and preparation method thereof
  • Large-sized ruthenium-based alloy sputtering target and preparation method thereof

Examples

  • Experimental program(2)
  • Comparison scheme(2)

Example Embodiment

[0033] Example 1
[0034] Ru of the present invention 51 Al 49 Alloy targets are prepared by the following methods:
[0035] (1) Raw material preparation: choose Ru and Al above 3N5 as raw materials;
[0036] (2) Preparation of alloy powder: according to Al 6 Ru or Al 13 Ru 4 The stoichiometric ratio of the intermetallic compound is 10-20Kg, and the vacuum gas atomization method is used to prepare the alloy powder. The material is melted in a vacuum medium frequency induction melting furnace, and the melting temperature is 1000-1600 ° C. The alloy solution is transferred into the tundish to start the gas Atomization, the atomization pressure is 5-8MPa. In order to avoid the introduction of impurities during the atomization process, high-purity argon gas above 4N is selected as the atomization gas. After the atomization is completed, it is sieved by a standard sieve, and the alloy powder below 100 μm is selected;
[0037] (3) Jet mill treatment: The atomized powder is subjected to jet mill treatment with a crushing pressure of 0.8-1.0 MPa. In order to avoid introducing impurities during the jet crushing process, the surface of the crushing cavity of the jet mill is plated with ruthenium, and the cavity The matrix of the body and ruthenium form a metallurgical bond, and regular inspection and repair treatment is carried out. 6 Ru or Al 13 Ru 4 Intermetallic compound brittle materials are used as crushing materials. This process can obtain RuAl alloy powder with an average particle size of 0.5-2.5 μm. The powder with this particle size is used to prepare the target material, so that the particle size of the target material is controlled below 10 μm, and the grain size varies. evenly distributed;
[0038] (4) material mixing: the above Al 6 Ru or Al 13 Ru 4 Alloy powder according to Ru 51 AL 49 The stoichiometric ratio is mixed with ruthenium powder with an average particle size of 0.5-2 μm and ball milled in a vacuum ball mill tank, and the ball milling speed is below 200r/min;
[0039] (5) Sintering molding: prepare a target material with a diameter of 168mm by vacuum hot pressing or spark plasma sintering with the above-mentioned homogeneously mixed materials. The sintering temperature is 900-1200°C and the sintering pressure is 30-50MPa.

Example Embodiment

[0040] Example 2
[0041] The difference from Example 1 is that the ruthenium-based alloy target is Ru 51 co 49 , the raw materials are Ru and Co above 3N5, and the stoichiometric ratio of the alloy powder is Ru in the hexagonal close-packed phase 3 co 7 , the melting temperature is 1600-1800°C, Ru 3 co 7 It is mixed with Ru powder according to the ratio of Ru51Co49, and the sintering temperature is 1100-1300°C.
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