Wave aberration measuring device and measuring method of optical system

An optical system and measurement device technology, applied in the field of optical measurement, can solve problems such as high-precision detection of wave aberrations in optical systems that are difficult to achieve, reduce the influence of stray light, improve energy utilization, and improve measurement speed and accuracy. Effect

Active Publication Date: 2014-10-15
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

However, when this method calibrates the error of the relay system and the Shack-Hartmann system, it needs to replace the optical system to be tested with an optical system with smaller wave aberration, which will cause two problems: on the one hand, the calibration results Including the systematic error of the relay system, the systematic error of the Shack-Hartmann wavefront sensor, the error of the microhole diffraction wavefront and the wave aberration of the optical system used, so that the measurement result of the wave aberration

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  • Wave aberration measuring device and measuring method of optical system
  • Wave aberration measuring device and measuring method of optical system
  • Wave aberration measuring device and measuring method of optical system

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[0038] First embodiment

[0039] Figure 1A It is a structural diagram of the first embodiment of the optical system wave aberration measuring device of the present invention, and this embodiment is a measuring device for performing wave aberration measurement of a finite or infinite conjugate optical system. Such as Figure 1A As shown, the measuring device includes a linearly polarized spherical wave point source 10, a first collimator 20, a 1 / 2 wave plate 30, a polarization beam splitter 40, a quarter wave plate 50, a second collimator 60, and a reflecting device 80 and Shak-Hartman wavefront sensor 90.

[0040] In this embodiment, a micro-hole can be used as an illumination system when the linearly polarized spherical wave point source is used. Figure 1B Shows its specific structure, such as Figure 1B As shown, the linearly polarized spherical wave point source includes a single-mode linear polarization maintaining fiber 101 for transmitting linearly polarized light, an imaging...

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[0053] Second embodiment

[0054] Figure 4 It is a structural diagram of the second embodiment of the optical system wave aberration measuring device of the present invention. This embodiment is a measuring device for measuring the wave aberration of an infinity conjugate optical system or a transmission plane wave optical system. Such as Figure 4 Shown, compared to Figure 1A In the first embodiment shown, the second collimating lens 60 is not included in the measuring device. That is to say, in the measuring device of the second embodiment, the circularly polarized plane wave emitted from the quarter wave plate is directly emitted to the reflecting device 80, and is reflected by the reflecting device 80 and then returned.

[0055] Figure 5A with Figure 5B Is to use Figure 4 The shown schematic diagram of the optical system wave aberration measuring device when measuring the wave aberration of an infinity conjugate optical system, where Figure 5A The display is used to measur...

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Abstract

The invention discloses a wave aberration measuring device and a wave aberration measuring method of an optical system. The device comprises a linear polarization plane wave producing source, a 1/2 wave plate, a polarization splitting prism, a 1/4 wave plate, a reflection unit and an HS (Shack-Hartmann) wave-front sensor, wherein the linear polarization plane wave producing source is used for generating a linear polarization plane wave; the 1/2 wave plate is used for converting the linear polarization plane wave to be an s polarization plane wave; the polarization splitting prism is used for reflecting the s polarization plane wave transmitted by the 1/2 wave plate to be 1/4 wave plate, and transmitting p polarized light transmitted by the 1/4 wave plate, and converting a circular polarization plane wave of the reflecting device to be a p polarization plane wave; the reflecting device is used for returning a circular polarization plane of the 1/4 wave plate along the same route; and the HS wave-front sensor is used for measuring the wave aberration of the p polarized light entering the HS wave-front sensor. The wave aberration measuring device is capable of realizing the high-precision detection of various complicate optical systems.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a measuring device and method for wave aberration of an optical system based on a Shack-Hartmann wavefront sensor. Background technique [0002] With the development of optical technology, various imaging optical systems have emerged. Modern advanced optical imaging systems represented by projection exposure optical systems in the semiconductor industry have extremely stringent requirements on system wave aberration and resolution. Waveform aberration is an important factor affecting the imaging performance and resolution of optical systems. Factors such as mechanical deformation caused by various factors in the design, processing, assembly and imaging process of the optical system will affect the wave aberration of the optical system. Therefore, high-precision system wave aberration detection plays a pivotal role in the manufacturing process of optical systems. ...

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Application Information

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IPC IPC(8): G01M11/02
Inventor 卢增雄齐月静苏佳妮杨光华周翊王宇
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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