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Wave aberration measuring device and measuring method of optical system

An optical system and measurement device technology, applied in the field of optical measurement, can solve problems such as high-precision detection of wave aberrations in optical systems that are difficult to achieve, reduce the influence of stray light, improve energy utilization, and improve measurement speed and accuracy. Effect

Active Publication Date: 2014-10-15
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

However, when this method calibrates the error of the relay system and the Shack-Hartmann system, it needs to replace the optical system to be tested with an optical system with smaller wave aberration, which will cause two problems: on the one hand, the calibration results Including the systematic error of the relay system, the systematic error of the Shack-Hartmann wavefront sensor, the error of the microhole diffraction wavefront and the wave aberration of the optical system used, so that the measurement result of the wave aberration of the system under test The wave aberration of the optical system used in the calibration process is included in the calibration process. On the other hand, in order to achieve a higher precision detection of the system wave aberration, a higher precision optical system needs to be used in the calibration process, and the wave aberration of the actual optical system Aberrations are limited by the diffraction limit, therefore, it is difficult for the above methods to achieve high-precision detection of wave aberrations in optical systems

Method used

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  • Wave aberration measuring device and measuring method of optical system

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no. 1 example

[0039] Figure 1A It is a structural diagram of the first embodiment of the optical system wave aberration measuring device of the present invention, and this embodiment is a measuring device for measuring wave aberration of a finite or infinite conjugate optical system. like Figure 1A As shown, the measurement device includes a linearly polarized spherical wave point source 10, a first collimating mirror 20, a 1 / 2 wave plate 30, a polarization beam splitter prism 40, a 1 / 4 wave plate 50, a second collimating mirror 60, and a reflection device 80 and the Shaker-Hartmann wavefront sensor 90.

[0040] In this embodiment, the microhole can be used as the illumination system when the linearly polarized spherical wave point source is used. Figure 1B shows its specific structure, such as Figure 1B As shown, the linearly polarized spherical wave point source includes a single-mode linear polarization maintaining optical fiber 101 for transmitting linearly polarized light, an imag...

no. 2 example

[0054] Figure 4 It is a structural diagram of the second embodiment of the optical system wave aberration measuring device of the present invention, which is a measuring device for measuring wave aberration of an infinite conjugate optical system or a transmitted plane wave optical system. like Figure 4 shown, compared to Figure 1A In the first embodiment shown, the second collimating lens 60 is not included in the measuring device. That is to say, in the measuring device of the second embodiment, the circularly polarized plane wave emitted by the 1 / 4 wave plate is directly emitted to the reflecting device 80 , and returned after being reflected by the reflecting device 80 .

[0055] Figure 5A and Figure 5B is to use Figure 4 The schematic diagram of the optical system wave aberration measuring device when measuring the wave aberration of the conjugate optical system at infinity is shown, wherein Figure 5A Shown is the overall wave aberration used to measure the op...

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Abstract

The invention discloses a wave aberration measuring device and a wave aberration measuring method of an optical system. The device comprises a linear polarization plane wave producing source, a 1 / 2 wave plate, a polarization splitting prism, a 1 / 4 wave plate, a reflection unit and an HS (Shack-Hartmann) wave-front sensor, wherein the linear polarization plane wave producing source is used for generating a linear polarization plane wave; the 1 / 2 wave plate is used for converting the linear polarization plane wave to be an s polarization plane wave; the polarization splitting prism is used for reflecting the s polarization plane wave transmitted by the 1 / 2 wave plate to be 1 / 4 wave plate, and transmitting p polarized light transmitted by the 1 / 4 wave plate, and converting a circular polarization plane wave of the reflecting device to be a p polarization plane wave; the reflecting device is used for returning a circular polarization plane of the 1 / 4 wave plate along the same route; and the HS wave-front sensor is used for measuring the wave aberration of the p polarized light entering the HS wave-front sensor. The wave aberration measuring device is capable of realizing the high-precision detection of various complicate optical systems.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a measuring device and method for wave aberration of an optical system based on a Shack-Hartmann wavefront sensor. Background technique [0002] With the development of optical technology, various imaging optical systems have emerged. Modern advanced optical imaging systems represented by projection exposure optical systems in the semiconductor industry have extremely stringent requirements on system wave aberration and resolution. Waveform aberration is an important factor affecting the imaging performance and resolution of optical systems. Factors such as mechanical deformation caused by various factors in the design, processing, assembly and imaging process of the optical system will affect the wave aberration of the optical system. Therefore, high-precision system wave aberration detection plays a pivotal role in the manufacturing process of optical systems. ...

Claims

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Application Information

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IPC IPC(8): G01M11/02
Inventor 卢增雄齐月静苏佳妮杨光华周翊王宇
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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